Abstract
Four high quality nanostructured thin films of titanium nitride, with thicknesses equal to 81, 325, 485 and 565 nm respectively, were deposited on glass substrates by the reactive magnetron sputtering method using different DC power values (from 200 to 410 W). The results revealed that the DC power plays a crucial role in the evolution of the thickness, topography, microstructure, optical and semiconducting properties of the resulting thin films. Specifically, an increase in the DC power enhances the crystalline order of the samples, consequently; the energy band gap values and the electrical resistivity decrease. Also, a competitive growth of crystalline planes of different orientations was found as a consequence of the increment of the grain size. In addition, the influence of DC power on the 3-D surface morphology of these thin films was investigated. The largest peak height and also the largest valley depth from the mean surface increased at higher amounts of DC power. The flexible variation of the physical properties of thin films with the simple and reproducible variation of the DC power in the sputtering process could be exploited in the use of these samples in specific technological applications.
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Arman, A., Ghodselahi, T., Molamohammadi, M., Solaymani, S., Zahrabi, H., Ahmadpourian, A.: Microstructure and optical properties of Cu@ Ni nanoparticles embedded in aC: H. Prot. Met. Phys. Chem. Surf. 51(4), 575–578 (2015a)
Arman, A., Ţălu, Ş., Luna, C., Ahmadpourian, A., Naseri, M., Molamohammadi, M.: Micromorphology characterization of copper thin films by AFM and fractal analysis. J. Mater. Sci.: Mater. Electron. 26(12), 9630–9639 (2015b)
Chawla, V., Jayaganthan, R., Chandra, R.: Structural characterization of magnetron sputtered nanocrystalline TiN thin films. Mater. Charact. 59, 1015–1020 (2008)
Gelali, A., Ahmadpourian, A., Bavadi, R., Hantehzadeh, M.R., Ahmadpourian, A.: Characterization of microroughness parameters in titanium nitride thin films grown by DC magnetron sputtering. J. Fusion Energy 31(6), 586–590 (2012)
Ghobadi, N.: Derivation of ineffective thickness method for investigation of the exact behavior of the optical transitions in nanostructuredthin films. J. Mater. Sci.: Mater. Electron. (2015). doi:10.1007/s10854-016-4925-3
Ghobadi, N., Ganji, M., Luna, C., Arman, A., Ahmadpourian, A.: Effects of substrate temperature on the properties of sputtered TiN thin films. J. Mater. Sci.: Mater. Electron. 27, 2800–2808 (2016)
Ghodselahi, T., Arman, A.: Magnetoresistance of Cu–Ni nanoparticles in hydrogenated amorphous carbon thin films. J. Mater. Sci.: Mater. Electron. 26(6), 4193–4197 (2015)
Hultman, L.: Thermal stability of nitride thin films. Vacuum 57, 1–30 (2000)
ISO 25178-2: 2012, Geometrical product specifications (GPS)—Surface texture: Areal—Part 2: Terms, definitions and surface texture parameters. http://www.iso.org. Accessed 28 Mar 2015
Köstenbauer, H., Fontalvo, G.A., Kapp, M., Keckes, J., Mitterer, C.: Annealing of intrinsic stresses in sputtered TiN films: the role of thickness-dependent gradients of point defect density. Surf. Coat. Technol. 201, 4777–4780 (2007)
Kulesza, S., Bramowicz, M.: A comparative study of correlation methods for determination of fractal parameters in surface characterization. Appl. Surf. Sci. 293, 196–201 (2014)
Ma, C.H., Huang, J.H., Chen, H.: Nanohardness of nanocrystalline TiN thin films. Surf. Coat. Technol. 200, 3868–3875 (2006)
Ma, L.W., Cairney, J.M., McGrouther, D., Hoffman, M., Munroe, P.R.: Three dimensional imagine of deformation modes in TiN based thin films coatings. Thin Solid Films 515, 3190–3195 (2007)
Molamohammadi, M., Luna, C., Arman, A., Solaymani, S., Boochani, A., Ahmadpourian, A., Shafiekhani, A.: Preparation and magnetoresistance behavior of nickel nanoparticles embedded in hydrogenated carbon film. J. Mater. Sci.: Mater. Electron. 26(9), 6814–6818 (2015a)
Molamohammadi, M., Arman, A., AchourB, A., Astinchap, A., Ahmadpourian, A., Boochani, S., Naderi, A.Ahmadpourian: Microstructure and optical properties of cobalt–carbon nanocomposites prepared by RF-sputtering. J. Mater. Sci.: Mater. Electron. 26(8), 5964–5969 (2015b)
Mountains Map® 7 Software (Digital Surf, Besançon, France). http://www.digitalsurf.fr. Accessed 28 Mar 2015
Patsalas, P., Charitidis, C., Logothetidis, S.: The effect of substrate temperature and biasing on the mechanical properties and structure of sputtered titanium nitride thin films. Surf. Coat. Technol. 125, 335–340 (2000)
Pelleg, J., Zevin, L.Z., Lungo, S.: Reactive-sputter-deposited TiN films on glass substrates. Thin Solid Films 197, 117–128 (1991)
Petrov, I.: Microstructural evolution during film growth. J. Vac. Sci. Technol. 21, S117–S128 (2003)
Popović, N., Bogdanov, Ž., Goncić, B., Zec, S., Rakočević, Z., Zlatanović, M., Peruško, D.: TiN thin films deposited by ion beam sputtering: effects of energetic particles bombardment. Thin Solid Films 459, 286–291 (2004)
Sundgren, J.E.: Structure and properties of TiN coatings. Thin Solid Films 128, 21–44 (1985)
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Ghobadi, N., Ganji, M., Luna, C. et al. The effects of DC power on the physical properties and surface topography of sputtered TiN nanostructured thin films. Opt Quant Electron 48, 467 (2016). https://doi.org/10.1007/s11082-016-0742-4
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DOI: https://doi.org/10.1007/s11082-016-0742-4