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Characterization and control of microstructure in combinatorially prepared aluminum-silicon thin film nanocomposites

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Abstract

In this paper, we describe the application of thin film combinatorial deposition methods to systematically control the microstructure of AlxSi(1−x) alloys through variations in composition and growth temperature. Discrete libraries of compositionally graded films have been sputter deposited onto silicon substrates to produce two structural phase regions: amorphous a-(Al-Si) and amorphous a-Si plus crystalline c-Al. The microstructure was investigated using x-ray diffraction while atomic force microscopy techniques were used to obtain surface morphology and phase distribution.

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Olk, C.H., Haddad, D.B. Characterization and control of microstructure in combinatorially prepared aluminum-silicon thin film nanocomposites. Journal of Materials Research 21, 1221–1228 (2006). https://doi.org/10.1557/jmr.2006.0164

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  • DOI: https://doi.org/10.1557/jmr.2006.0164

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