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Plasma-Assisted Chemical Vapor Deposition Processes

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Conclusions

The examples described in this article illustrate that plasma-assisted CVD processes are versatile tools for preparing the highly sophisticated materials and properties needed in today’s high-tech industries. They feature low temperature processing, non-equilibrium material compositions, high purity of the product, and excellent controllability of the process. Despite a history of more than two decades, the full application potential of plasma-assisted CVD is yet to come. However, in many cases, additional basic knowledge of plasmachemical reactions is necessary in order to further optimize existing technologies and to develop new plasma applications.

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Authors
  1. P. K. Bachmann
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  2. G. Gärtner
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  3. H. Lydtin
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Bachmann, P.K., Gärtner, G. & Lydtin, H. Plasma-Assisted Chemical Vapor Deposition Processes. MRS Bulletin 13, 52–59 (1988). https://doi.org/10.1557/S0883769400063703

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