Abstract
We studied submonolayer and multilayer deposition of Co on Au(111) using in-situ oblique-incidence optical reflectance difference (OI-RD). We show that the optical technique is highly sensitive and accurate in determining the electrodeposited film thickness and growth mode. We found that the optically determined thickness of the ultrathin Co film is in very good agreement with that deduced from the integration of the anodic current during cyclic voltammetry (CV). From a weak oscillatory behavior of the optical reflectance difference signal, it seems that the growth of electrodeposited Co on Au(111) under pulsed deposition condition proceeds by a combination of three dimensional island and quasi layer-by-layer growth modes.
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Gray, J., Schwarzacher, W. & Zhu, X.D. An In-Situ Oblique-Incidence Optical Reflectance Difference Study of Co Electrodeposition on a Polycrystalline Au(111) Surface. MRS Online Proceedings Library 721, 14 (2002). https://doi.org/10.1557/PROC-721-J1.4
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DOI: https://doi.org/10.1557/PROC-721-J1.4