Abstract
Photopatternable hybrid inorganic-organic polymers with negative resist behaviour have been developed and tested for evaluation in optical and electrical interconnection technology. They are composed of inorganic oxidic structures cross-linked or substituted by organic groups. The synthesis starts from organosilane precursors reacted by sol-gel-processing in combination with organic crosslinking of polymerisable organic functions. As a result of these functionalities the properties of the ORMOCER®s are adjusted to the particular applications. Systematic variation of composition combined with adaptation to micro system technology allows great flexibility in processing. The main features of these materials are:
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• Combined use as dielectric and passivation layers in electrical systems and devices as well as core and cladding for optical applications enables e/o applications with high integration levels.
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• Postbaking at moderate temperatures (120 – 170 °C) enables processing on low-cost substrates such as FR-4 (a glass-fibre reinforced epoxy-polymer).
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• Easily adaptable to thin film technology: spin-on with planarisation > 90 %, via diameters down to 20 μm and high aspect ratio for optical waveguides have been achieved.
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Synthesis, modification of the resins towards technological needs, their thin film technology and the resulting demonstrators will be discussed.
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Popall, M., Buestrich, R., Kahlenberg, F. et al. Electrical and Optical Interconnection-Technology based on Ormocer® - Inorganic-Organic Hybrid Materials. MRS Online Proceedings Library 628, 94 (2000). https://doi.org/10.1557/PROC-628-CC9.4
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DOI: https://doi.org/10.1557/PROC-628-CC9.4