Abstract
Ion beam synthesis of SiC/Si heterostructures was performed by MIEVVA (metal vapor vacuum arc) implantation under various implantation and annealing conditions. The implanted SiC/Si heterostructures were characterized by various techniques. Carbon redistribution in overstoichiometrically implanted samples during annealing to form a stoichiometric SiC layer has been observed for the first time. The FTIR spectra were found to be composed of two components, one attributed to amorphous SiC and the other to ß-SiC. It was also found that there are critical dose and critical energy at which the crystalline fraction increases abruptly. Other results on electrical and optical characterization are also presented and discussed.
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Wong, S.P., Ho, L.C., Cihen, D. et al. Ion Beam Synthesis of SiC/Si Heterostructures by MEVVA Implantation. MRS Online Proceedings Library 439, 167–172 (1996). https://doi.org/10.1557/PROC-439-167
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DOI: https://doi.org/10.1557/PROC-439-167