Abstract
In the present paper the authors present new results on thin (μc-SiC:H films deposited at low temperatures by the Very High Frequency - Glow Discharge technique (VHF-GD) at 70 MHz. The individual effects of each of the deposition parameters (methane and diborane gas phase ratios, input power, deposition temperature and pressure) are investigated with respect to the structural, optical and electrical properties of the films; the goal being the growth of optimised, thin μc-SiC:H layers for use as highly conductive and high gap window layers in solar cells.
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Fluckiger, R., Meier, J., Shah, A. et al. Structural, Optical and Electrical Properties of <p>μc-SiC∶H Thin Films Deposited by the VHF-GD. MRS Online Proceedings Library 358, 793 (1994). https://doi.org/10.1557/PROC-358-793
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DOI: https://doi.org/10.1557/PROC-358-793