Abstract
We present result following localized ion implantation of rutile titanium dioxide (TiO2) using anodic porous alumina as a mask. The implantation were performed with 100 keV 56Fe+ ions using a fluence of 1.3-1016 ions/cm2. The surface modifications where studied by means of SEM, AFM/MFM and XRD. A well-defined hexagonal pattern of modified material in the near surface structure is observed. Local examination of the implanted areas revealed no clear magnetic signal. However, a variation in mechanical and electrostatic behavior between implanted and non-implanted zones is inferred from the variation in AFM signals.
Similar content being viewed by others
References
A. Meldrum R. F. Haglund, Jr., L. A. Boatner and C. W. White. Adv. Mater. 13, 1431 (2001).
T. Shibata K. Suguro K. Sugihara; T. Nishishashi; J. Fujiyama; Y. Sakurada IEEE transactions on semiconductor manufacturing 15, 183, (2002).
E. Knystautas ‘Engineering Thin Films and Nanostructures with Ion Beams’, Optical Science and Engineering Series Vol. 95 CRC Press (2005).
Ion-beam-based Nanofabrication, edited by D. Ila J. Baglin N. Kishimoto P.K. Chu MRS symposium proc. Vol 1020 (2007), and MRS spring meeting 2009, symposium DD.
N. Matsuura {etet al}, Appl. Phys. Lett. 81, 4826 (2002).
S.W. Shin {etet al}, Nanotechnology 16, 1392 (2005).
M. Nakamura S. Nigo N. Kishimoto Trans. Mater. Res. Soc. Jpn. 33, 1101 (2008).
R. Janisch P. Gopal and N. A Spaldin. J. Phys.: Condens. Matter 17, R657 (2005).
M. Guermazi {etet al}, Mat. Res. Bull. 18, 529 (1983)
M. Zhou {etet al}, J. Appl. Phys. 103, 083907 (2008).
A. Fujishima K. Hashimoto and T. Watanabe TiO2 Photocatalysis: Fundaments and Applications, BKC, Tokio, (1999).
C. Adàn, A. Bahamonde M. Fernández-García, A. Martínez-Arias, Appl. Catal. B 72, 11 (2007).
J. Jensen M. Skupinski K. Hjort R. Sanz Nucl. Instrum. and Methods B 266, 3113 (2008).
H. Masuda and F. Fukuda Science 268, 1466 (1995).
R. Sanz J. Jensen A. Johansson M. Skupinski G. Possnert M. Boman M. Hernandez-Vélez, M. Vazquez K. Hjort. Nanotechnology 18, 305303 (2007).
S. Zhu L.M. Wang X.T. Zu and X. Xiang Appl. Phys. Lett. 88, 043107 (2006).
C. Dumas {etet al}, Microelectronic Engineering 85, 2358 (2008).
U. Diebold Surf. Sci. Rep. 48, 53 (2003).
R. Sanz J. Jensen G. González-Díaz, O. Martínez, M. Vázquez and M. Hernández-Vélez, Nanoscale Research. Lett., Accepted (2009).
K. Sun S. Zhu R. Fromknecht G. Linker L.M. Wang Materials Letters 58, 547 (2004).
R. Fromknecht G. Linker L.M. Wang S. Zhu K. Sun A. van Veen, M. van Huis, J. Niemeyer T. Weimann J. Wang Surf. Interface Anal. 36, 193 (2004).
Acknowledgments
This work was supported in part by the Spanish Ministry of Education under Grant MAT2007-6042. J. Jensen thanks the Carl Tryggers Foundation and Linköping University through the VR Linneaus grant LiLi-NFM for financial support. M.J. Thanks the CAM for the financial support.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Jensen, J., Sanz, R., Jaafar, M. et al. Localized 56Fe+ ion implantation of TiO2 using anodic porous alumina. MRS Online Proceedings Library 1181, 23–28 (2009). https://doi.org/10.1557/PROC-1181-DD01-04
Published:
Issue Date:
DOI: https://doi.org/10.1557/PROC-1181-DD01-04