Abstract
The nanostructural evolution during heat treatments of direct-current magnetronsputtered Ag films, deposited at room temperature at different substrate bias voltages, was experimentally studied. A growth chamber equipped with a magnetron and Kapton windows for in-situ x-ray diffraction was mounted on a six-circle goniometer at a synchrotron beam line. Bragg–Brentano x-ray diffraction was used to monitor the (111) Bragg peak during thermal annealing of the Ag films. In addition, to investigate the 〈111〉 fiber texture, one-dimensional pole figures were measured ex situ. The thermal stability of the nanostructure was sensitively dependent on the substrate bias voltage. Increasing the bias voltage resulted in significantly lower rates of grain growth, which we ascribe mainly to the formation of Ar bubbles. Furthermore, the grain size in the as-deposited films decreased with increasing bias voltage while the width of the one-dimensional pole figures increased.
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Almtoft, K.P., Bøttiger, J., Chevallier, J. et al. Influence of the substrate bias on the size and thermal stability of grains in magnetron-sputtered nanocrystalline Ag films. Journal of Materials Research 20, 1071–1080 (2005). https://doi.org/10.1557/JMR.2005.0143
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DOI: https://doi.org/10.1557/JMR.2005.0143