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Effects of process variables on properties and composition of a-Si:C:H films

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Abstract

Physical properties of a-Si:C:H films, including composition, optical constants, microhardness, and surface energy, were investigated. A factorial experimental design was employed to establish the effects of plasma-assisted chemical vapor deposition parameters on the physical properties of the films. The dynamics of the plasma deposition process are discussed in relation to the interactions observed among the process variables and the effects of the variables on the physical properties of the films.

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Authors and Affiliations

  1. Center for Advanced Materials Processing, Clarkson University, Box 5705, 13699, Potsdam, New York, USA

    I. L. Moskowitz & S. V. Babu

  2. Department of Physics, State University of New York at Albany, 12222, Albany, New York, USA

    W. A. Lanford

Authors
  1. I. L. Moskowitz
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  2. W. A. Lanford
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  3. S. V. Babu
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Correspondence to I. L. Moskowitz.

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Moskowitz, I.L., Lanford, W.A. & Babu, S.V. Effects of process variables on properties and composition of a-Si:C:H films. Journal of Materials Research 18, 129–138 (2003). https://doi.org/10.1557/JMR.2003.0019

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  • DOI: https://doi.org/10.1557/JMR.2003.0019

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