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Chemical composition and properties of films produced from hexamethyldisilazane by plasma-enhanced chemical vapor deposition

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Abstract

Relationships between the chemical composition of the gas phase and the properties of SiC x N y H z films produced from hexamethyldisilazane by plasma-enhanced chemical vapor deposition have been studied. The plasma composition has been examined by optical emission spectroscopy. Thermal analysis of the films with simultaneous mass spectrometric detection of released gases has been performed. On the basis of the results and published data, mechanisms for the formation of films by plasma polymerization have been proposed and the film growth at a low plasma power and high reactor temperatures has been found to follow the heterogeneous mechanism.

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Authors and Affiliations

  1. Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences, pr. Akademika Lavrent’eva 3, Novosibirsk, 630090, Russia

    V. R. Shayapov, Yu. M. Rumyantsev & P. E. Plyusnin

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  1. V. R. Shayapov
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  2. Yu. M. Rumyantsev
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  3. P. E. Plyusnin
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Correspondence to V. R. Shayapov.

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Original Russian Text © V.R. Shayapov, Yu.M. Rumyantsev, P.E. Plyusnin, 2016, published in Khimiya Vysokikh Energii, 2016, Vol. 50, No. 3, pp. 221–226.

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Shayapov, V.R., Rumyantsev, Y.M. & Plyusnin, P.E. Chemical composition and properties of films produced from hexamethyldisilazane by plasma-enhanced chemical vapor deposition. High Energy Chem 50, 213–218 (2016). https://doi.org/10.1134/S0018143916030127

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  • DOI: https://doi.org/10.1134/S0018143916030127

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