Abstract
TiO2 was deposited onto hard alumite (Al/Al2O3/TiO2) by alternating current electrolysis and precipitation in (NH4)2[TiO(C2O4)2] solution at various temperatures, where the hard alumite was prepared by the anodic oxidation of aluminum in sulfuric acid (Al/Al2O3). The TiO2 electrodeposition mainly occurred at temperatures lower than about 50 °C, while the TiO2 deposition due to TiO(C2O4)22− adsorption onto alumina predominantly occurred at temperatures higher than about 50 °C. The amount of deposited TiO2 increased with the increase in the deposition temperature, leading to high photocatalytic activity. The deposited TiO2 at 90 °C followed by heat-treatment at 550 °C had an anatase structure and showed a high photocatalytic activity for the decomposition of acetaldehyde even under fluorescent lamp illumination. The Al/Al2O3/TiO2 prepared at 50 °C was optimal for practical use, because of a relatively high activity and the sufficient adhesion strength between the TiO2 and the Al/Al2O3 substrate due to the presence of the deposited TiO2 in the pores of the alumina film.
Similar content being viewed by others
References
A. Fujishima and K. Honda, Nature 37, 238 (1972).
C.D. Jaeger and A.J. Bar, J. Phys. Chem. 83, 3146 (1979).
H.V. Damme and W.K. Hall, J. Am. Chem. Soc. 101, 4373 (1979).
S. Sato and J.M. White, Chem. Phys. Lett. 72, 83 (1980).
M.V. Rao, K. Rejeswar, V.R.D. Vernecker and J. DuBow, J. Phys. Chem. 84, 1987 (1980).
S. Sato and J.M. White, J. Phys. Chem. 85, 592 (1981).
S.N. Frank and A.J. Bard, J. Am. Chem. Soc. 99, 303 (1977).
T. Inoue, A. Fujishima, S. Kornishi, and K. Honda, Nature 277, 637 (1979).
B. Kraeutler and A.J. Bard, J. Am. Chem. Soc. 100, 2239 (1978).
H. Yoneyama, Y. Takao, H. Tamura, and A.J. Bard, J. Phys. Chem. 87, 1417 (1983).
J.C.S. Wong, A. Linsebigler, G. Lu, J. Fan, and J.T. Yates, Jr., J. Phys. Chem. 99, 335 (1995).
Z. Goren, I. Willner, A.J. Nelson, and A.J. Frank, J. Phys. Chem. 94, 3784 (1990).
H. Aritani, N. Akasaka, T. Tanaka, T. Funabiki, S. Yoshida, H. Gotoh, and Y. Okamoto, J. Chem. Soc., Faraday Trans. 92, 2625 (1996).
I. Sopyan, M. Watanabe, S. Murasawa, K. Hashimoto, and A. Fujishima. J. Photochem. Photobiol. A 98, 79 (1996).
A.J. Nozik and R. Memming, J. Phys. Chem. 100, 13061 (1996).
C. Anderson and A.J. Bard, J. Phys. Chem. 99, 9882 (1995).
H. Yamashita, Y. Ichihashi, M. Harada, G. Stewart, M.A. Fox, and M. Anpo, J. Catal. 158, 97 (1996).
N. Negishi, T. Iyada, K. Hashimoto, and A. Fujishima, Chem. Lett. 841 (1995).
K. Hashimoto and A. Fujishima, TiO2 Photocatalysis (CMC, Tokyo, Japan, 1998), pp. 94, 119.
G. Dagan and M. Tomikiewicz, J. Phys. Chem. 97, 12651 (1993).
A. Sclafani, L. Palmisano, and M. Schiavello, J. Phys. Chem. 94, 829 (1990).
B. Ohtani, R.M. Bowman, Jr., G.P. Colombo, H. Kominami, H. Noguchi, and K. Uosaki, Chem. Lett. 579 (1998).
N.B. Jackson, C.M. Wang, Z. Luo, J. Schwitzgebel, J.G. Ekerdt, J.R. Brock, and A. Heller, J. Electrochem. Soc. 138, 3660 (1991).
H. Matsubara, M. Takada, S. Koyama, K. Hashimoto, and A. Fujishima, Chem. Lett. 767 (1995).
S. Deki, Y. Aoi, O. Hiroi, and A. Kajinamim, Chem. Lett. 433 (1996).
H. Miyoshi, S. Nippa, H. Uchida, H. Mori, and H. Yoneyama, Bull. Chem. Soc. Jpn. 63, 3380 (1990).
K. Ikeda, H. Sakai, R. Baba, K. Hashimoto, and A. Fujishima, J. Phys. Chem. B 101, 2617 (1997).
L. Kavan, B. O’Regan, A. Kay, and M. Grätzel, J. Electroanal. Chem. 346, 291 (1993).
B. Ohtani, Y. Ogawa, and S. Nishimoto, J. Phys. Chem. B 101, 3746 (1997).
I. Mita, K. Kuroda, K. Suzuki, Y. Muramatsu, S. Nemoto, and M. Yamada, in Handbook of Aluminum Surface Treatment (Light Metal Publishing, Tokyo, Japan, 1980), pp. 987, 1200.
T. Sato, Trans. Inst. Met. Finish. 60, 25 (1982).
A.P. Li, F. Müller, A. Birner, K. Nielsch, and U. Gösele, J. Appl. Phys. 84, 6023 (1998).
H. Masuda, F. Hasegawa, and S. Ono, J. Electrochem. Soc. 144, 127 (1997).
T. Sato and S. Sakai, Trans. Inst. Met. Finish. 57, 43 (1979).
Y. Matsumoto, Y. Ishikawa, M. Nishida, and S. Ii, J. Phys. Chem. B 104, 4204 (2000).
Y. Ishikawa and Y. Matsumoto, Electrochim. Acta 46, 2819 (2001).
G. Xiong, Z. Feng, J. Li, Q. Yang, P. Ying, Q. Xin, and C. Li, J. Phys. Chem. B 104, 3581 (2000).
M.A.C. Alosio and G.E. Jean, Appl. Catal. A 167, 203 (1998).
X. Liu, K.K. Lu, and J.K. Thomas, J. Chem. Soc., Faraday Trans. 89, 1861 (1993).
H. Uchida, S. Hirao, T. Torimoto, S. Kuwabata, T. Sakata, H. Mori, and H. Yoneyama, Langmuir 11, 3725 (1995).
K. Domen, Y. Sakata, A. Kudo, K. Maruya, and T. Onishi, Bull. Chem. Soc. Jpn. 61, 359 (1988).
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Ishikawa, Y., Hayashi, Y. & Matsumoto, Y. Preparation of titanium(IV) oxide film on a hard alumite substrate. Journal of Materials Research 17, 2373–2378 (2002). https://doi.org/10.1557/JMR.2002.0347
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1557/JMR.2002.0347