Abstract
Electrodeposited thin films of CdTe and CdxHg1−xTe with 1 − x = 0 and approximately 0.1 were characterized by x-ray photoelectron spectroscopy. The composition of the bulk and the thickness and composition of the native surface oxide before and after Ar+ ion sputtering were determined. A surface oxide layer 20-Å thick constituted mainly of alloyed TeO2 and CdO was found over a nearly stochiometric bulk. Chemical diffusion of Hg, Cd, and Te to the surface was observed. Hg appears to inhibit oxidation of the telluride, mainly of Te. Ar sputtering removed undesirable oxides and impurities off the films.
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J.P. Williams, S.P. Wilks, R.H. Williams, and H.A. Tarry, J. Vac. Sci. Technol. A 13, 2676 (1995).
B.M. Basol, O.M. Stafsudd, and B. Bindel, Sol. Cells 15, 279 (1985).
S.N. Sahu, M.J. Antonio, and C. Sánchez, Sol. Energy Mater. Sol. Cells 43, 223 (1996).
G.H. Winton, L. Faraone, and R. Lamb, J. Vac. Sci. Technol. A 12, 35 (1994).
L.E. Berlouis, L.M. Peter, and P.A.H. Fennell, J. Appl. Phys. 68, (1990).
Y.S. Wu, C.R. Becker, A. Wang, R. Schemiedl, S. Einfeldt, and G. Landwehr, J. Appl. Phys. 73, 7385 (1993).
B.M. Basol, Sol. Cells 23, 69 (1988).
H. Uda, H. Taniguchi, M. Yoshida, and T. Yamashita, Jpn. J. Appl. Phys. 17, 585 (1978).
T.L. Chu, S.S. Chu, F. Firszt, H.A. Haseem, R. Stawski, and G. Xu, Proc. IEEE Photovoltaic Spec. Conf. 18, 1645 (1985).
A. Hartley, S.J.C. Irvine, and M.D.G. Potter, Thin solid films, 387, 89 (2001).
J. Touskova, D. Kindl, and J. Toušek, Thin Solid Films 293, 272 (1997).
B.M. Basol and E.S. Tseng, Appl. Phys. Lett. 48, 946 (1986).
M. Neumann-Spallart, G. Tamizhmani, and C. Levy-Clement, J. Electrochem. Soc. 137, 3434 (1990).
C.L. Colyer and M. Cocivera, J. Electrochem. Soc. 139, 406 (1992).
M.P.R. Panicker, M. Knaster, and F.A. Kroger, J. Electrochem. Soc. 125, 556 (1978).
J. Ramiro and E.G. Camarero, J. Mater. Sci. 31, 2047 (1996).
E.G. Camarero, J. Ramiro, and E. Fatas, Sol. Energy Mater. Sol. Cells 39, 31 (1995).
C. Levy Clement, R. Triboulet, and R. Tenne, Sol. Energy Mater. 17, 204 (1988).
E. García Camarero, F. Arjona, C. Guillén, and E. Fatás; Mater. Chem. Phys. 26, 421 (1990).
S.N. Sahu and C. Sánchez, Solid State Commun. 73, 597 (1990).
M. Neumann Spallart, G. Tamizhmani, A. Boutry-Forveille, and C. Levy-Clement, Thin Solid Films 169, 315 (1989).
A. Kampmann, P. Cowache, D. Lincot, and J. Vedel, J. Electroanal. Chem. 387, 53 (1995).
P. Cowache, D. Lincot, and J. Vedel, J. Electrochem. Soc. 136, 1646 (1989).
A. Kampmann, P. Cowache, D. Lincot, and J. Vedel, J. Cryst. Growth 146, 256 (1995).
A. Kampmann and D. Lincot, J. Electroanal. Chem. 418, 73 (1996).
Y.S. Wu, C.R. Becker, A. Wang, R. Schmiedl, S. Einfeldt, and G. Landwehr, J. Appl. Phys. 73(11), 7385 (1993).
X. Yi and J.J. Liou, Solid State Electron. 38, 1151 (1995).
E. Mori, K.K. Mishra, and K. Rajeshwar, J. Electrochem. Soc. 137, 1100 (1990).
A. Bennouna, Y. Laaziz, and M.A. Idrissi, Thin Solid Films 213, 55 (1992).
U. Solzbach and H.J. Richter, Surf. Sci. 97, 191 (1980).
J.B. Malherbe, Appl. Surf. Sci. 70/71, 322 (1993).
R.Z. Morawski, L. Szczecinski, and A. Barwicz, J. Chemom. 9, (1995).
P.M.A. Sherwood, Practical Surface Analysis. Vol. 1: Auger and X-ray Photoelectron Spectroscopy, 1st ed., edited by D. Briggs and M.P. Seah (Wiley, Chinchester, United Kingdom, 1990).
F.J. Grunthaner and P.J. Grunthaner, Mater. Sci. Rep. 1, 65 (1986).
C.D. Wagner, in Practical Surface Analysis. Vol. 1: Auger and X-ray Photoelectron Spectroscopy, 2nd ed., edited by D. Briggs and M.P. Seah (Wiley, New York, 1990), p. 595.
J.F. Moulder, W.F. Stickle, P.E. Sobol, and K.D. Bomben, Handbook of X-ray Photoelectron Spectroscopy, edited by J. Chastain (Perkin-Elmer Corporation, Physical Electronics Division, Eden Prairie, MN, 1992).
V.P. Parkhutik, J.M. Martinez-Duart, J. Perrie`re, A. Climent, Yu.E. Makushok, and J.M. Albella, Thin Solid Films 200, 129 (1991).
A.B. Christie, I. Sutherland, and J.M. Walls, Surf. Sci. 135, 225 (1983).
V.I. Nefedov, Handbook on X-ray Photoelectron Spectroscopy of Chemical Compounds (Khimiya, Moscow, Russia, 1984).
R.F. Farrow, P.N. Dennis, H.E. Bishop, N.R. Smart, and J.T. Wotherspoon, Thin Solid Films 88, 87 (1982).
L. Soriano, L. Galàn, and F. Rueda, Surf. Sci. 251/252, 1075 (1991).
T.L. Barr, Modern ESCA, The Principles and Practice of X-Ray Photoelectron Spectroscopy (CRC Press, Boca Raton, FL, 1994), pp. 7, 22, 194.
L. Galàn, I. Montero, F. Rueda, and J.M. Albella, Surf. Interface Anal. 19, 473 (1992).
S.S. Choi and G. Lucovsky, J. Vac. Sci. Technol. B 6, 1198 (1988).
C.D. Wagner, M. Riggs, L.E. Davis, and F. Moulder, in Handbook of X-ray Photoelectron Spectroscopy, edited by G.E. Mullenberg (Perkin-Elmer Corporation, Eden Prairie, MN, 1978).
T.L. Barr, Modern ESCA, The Principles and Practice of X-Ray Photoelectron Spectroscopy (CRC Press, Boca Raton, FL, 1994), p. 187.
C. Heske, U. Winkler, H. Neureiter, M. Sokolowski, R. Fink, E. Umbach, Ch. Jung, and P.R. Bressler, Appl. Phys. Lett. 70, 1022 (1997).
S. Tatarenko, F. Bassani, J.C. Klein, K. Saminadar, J. Cibert, and V.H. Etgens, J. Vac. Sci. Technol. A 12, 140 (1994).
L. Soriano, L. Galàn, and F. Rueda, Surf. Interface Anal. 16, 193 (1990).
V.I. Nefedov, Y.V. Salyn, P.M. Solozhenkin, and G.Y. Pulatov, Surf, Interface Anal. 2, 171 (1980).
D.A. Shirley, Phys. Rev. B 5, 4709 (1972).
H.E. Bishop, Surf. Interface Anal. 3, 272 (1981).
P. Steiner, H. Höchst, and S. Hüfner, in Photoemission in Solids II. Case Studies, edited by L. Ley and M. Cardona (SpringerVerlag, Heidelberg, New York, Topics in Appl. Phys. 27, 1979), p. 349.
H.M. Nitz, O. Ganschow, U. Kaiser, L. Wiedmann, and A. Benninghoven, Surf. Sci. 104, 365 (1981).
M.P. Seah and W.A. Dench, Surf. Interface Anal. 1, 2 (1979).
C. Morant, L. Galán, and F. Rueda, Surf. Interface Anal. 16, 304 (1990).
I. Montero, L. Galán, and F. Rueda, Surf. Sci. 298, 79 (1993).
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Ramiro, J., Galán, L., Camarero, E.G. et al. X-ray photoelectron spectroscopy of electrodeposited cadmium mercury telluride thin films and their native surface oxides. Journal of Materials Research 16, 1942–1952 (2001). https://doi.org/10.1557/JMR.2001.0266
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DOI: https://doi.org/10.1557/JMR.2001.0266