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Scanning Tunneling Spectroscopy Investigation of the Strained Si1−xGex Band Structure

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Abstract

The band offsets and band gap are the most important parameters that determine the electrical and optical behavior of a heterojunction. In situ scanning tunneling spectroscopy was employed to measure the valence-band offset of strained Si1−xGex-on-Si (100) for the first time. The valence-band offsets of the strained Si0.77Ge0.23 and Si0.59Ge0.41 on Si(100) were found to be 0.21 and 0.36 eV, respectively. The results were in good agreement with theory and with results from other experimental methods. Due to band bending and surface states, it was difficult to determine the conduction band edge at the interface of the Si1−xGex/Si exactly but we found that the conduction band offset is much smaller than the valence-band offset.

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Authors and Affiliations

  1. Microelectronics Research Center, University of Texas, Austin, Texas, 78712, USA

    Xiangdong Chen, Xiang-Dong Wang, Kou-Chen Liu, Dong-Won Kim & Sanjay Banerjee

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  1. Xiangdong Chen
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  2. Xiang-Dong Wang
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  3. Kou-Chen Liu
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  4. Dong-Won Kim
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  5. Sanjay Banerjee
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Chen, X., Wang, XD., Liu, KC. et al. Scanning Tunneling Spectroscopy Investigation of the Strained Si1−xGex Band Structure. Journal of Materials Research 15, 1257–1260 (2000). https://doi.org/10.1557/JMR.2000.0183

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  • DOI: https://doi.org/10.1557/JMR.2000.0183

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