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Surface modification of aluminum and chromium by ion implantation of nitrogen with a high current density ion implanter and plasma-source ion implantation

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Abstract

Results of ion implantation of nitrogen into electrodeposited hard chromium and pure aluminum by a high-dose ion-beam source are presented and compared to plasma-source ion implantation. The large-area, high current density ion-beam source can be characterized, with respect to surface modification use, by a uniform emitted dose rate in the range of 1016 to 5 × 1017 N cm−2 min−1 over an area of <100 cm2 and with acceleration energies of 10–50 keV. The implantation range and retained dose (measured using ion-beam analysis), the surface hardness, coefficient of friction, and the change in the wear coefficient (measured by nanohardness indentation and pin-on-disk wear testing) that were obtained with an applied dose rate of ∼1.7 × 1017 N cm−2 min−1 at 25 kV are given, and they are compared to results obtained with plasma-source ion implantation.

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Authors and Affiliations

  1. Los Alamos National Laboratory, P.O. Box 1663, Los Alamos, New Mexico, 87545, USA

    Zoran Falkenstein, Kevin C. Walter, Michael A. Nastasi & Donald J. Rej

  2. Institute of Electrophysics, Ural Division of the RAS, 620049, Yekaterinburg, Russia

    Nikolai V. Gavrilov

Authors
  1. Zoran Falkenstein
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  2. Kevin C. Walter
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  3. Michael A. Nastasi
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  4. Donald J. Rej
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  5. Nikolai V. Gavrilov
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Falkenstein, Z., Walter, K.C., Nastasi, M.A. et al. Surface modification of aluminum and chromium by ion implantation of nitrogen with a high current density ion implanter and plasma-source ion implantation. Journal of Materials Research 14, 4351–4357 (1999). https://doi.org/10.1557/JMR.1999.0589

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  • DOI: https://doi.org/10.1557/JMR.1999.0589

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