Abstract
The possibility of an autostoichiometric vapor deposition is explored. Heterometal-organic complexes such as double alkoxides are potential candidate precursors for such deposition. Two reaction schemes, the hydrolysis-assisted pyrolysis and the hydrolysis-polycondensation of double alkoxides, are identified to be autostoichiometric reactions. A simple low-pressure apparatus is suggested for autostoichiometric vapor deposition. Mass-flow analysis allows for the identification of a nonstoichiometry factor K which can be used as a quantitative measure of the precursor’s autostoichiometric capability.
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Xu, R. Autostoichiometric vapor deposition: Part I. Theory. Journal of Materials Research 10, 2536–2541 (1995). https://doi.org/10.1557/JMR.1995.2536
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DOI: https://doi.org/10.1557/JMR.1995.2536