Abstract
An Ir metal target was reactively rf sputtered in a planar magnetron source to develop iridium oxide deposition conditions. Gas blends of hydrogen, oxygen, and argon were used to provide competitive control over the reduction/oxidation characteristics of the sputter plasma. Optical emission spectroscopy allowed direct observation of hydrogen, oxygen, and iridium atomic peaks and OH molecular bands. Each of the twelve gas flow conditions could be clearly defined as either reducing or oxidizing by plasma emission spectroscopy. A given plasma reduction/oxidation state can be maintained over a wide range of gas flow conditions by coordinated adjustment of hydrogen and oxygen flows. The electrochemical properties of the iridium oxide films change dramatically in the vicinity of the reduction/oxidation plasma transition.
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D. Cheong and W.A. Sanders, J. Am. Ceram. Soc. 75, 3331 (1992).
G. E. Gazza, in Progress in Nitrogen Ceramics, edited by F. L. Riley (Martinus Nijhoff Publishers, The Hague, The Netherlands, 1983), p. 273.
K. Ueno and Y. Toibana, J. Ceram. Soc. Jpn. 91, 409 (1983).
W. A. Sanders and D. M. Mieskowski, Am. Ceram. Soc. Bull. 64, 304 (1985).
E. Tani, S. Umebayashi, K. Kishi, K. Kobayashi, and M. Nishijima, Am. Ceram. Soc. Bull. 65, 1311 (1986).
S. D. Nunn, T. N. Tiegs, K. L. Ploetz, C. A. Walls, and N. Bell, in Silicon Nitride Ceramics: Scientific and Technological Advances, edited by I-W. Chen, P. F. Becher, M. Mitomo, G. Petzow, and T-S. Yen (Mater. Res. Soc. Symp. Proc. 287, Pittsburgh, PA, 1993), p. 359.
A. Tsuge, H. Kudo, and K. Komeya, J. Am. Ceram. Soc. 57, 269 (1974).
R. R. Wills, S. Holmquist, J. M. Wimmer, and J. A. Cunningham, J. Mater. Sci. 11, 1305 (1976).
F. F. Lange, S. C. Singhal, and R.C. Kuznicki, J. Am. Ceram. Soc. 60, 249 (1977).
S. Horiuchi and M. Mitomo, J. Mater. Sci. 14, 2543 (1979).
L. J. Gauckler, H. Hohnke, and T. Y. Tien, J. Am. Ceram. Soc. 63, 35 (1980).
M. Mitomo, F. Izumi, S. Horiuchi, and Y. Matsui, J. Mater. Sci. 17, 2359 (1982).
M. K. Cinibulk, G. Thomas, and S. M. Johnson, J. Am. Ceram. Soc. 75, 2037 (1992).
J.S. Vetrano, H-J. Kleebe, E. Hampp, M. J. Hoffmann, M. Ruhle, and R. M. Cannon, J. Mater. Sci. 28, 3529 (1993).
H. Klemm and G. Pezzotti, J. Am. Ceram. Soc. 77, 553 (1994).
A. Rendtel, H. Hubner, and C. Schubert, in Silicon Nitride ‘93, edited by M. J. Hoffmann, P. F. Becher, and G. Petzow (Proceedings of the International Conference on Silicon Nitride-Based Ceramics, Stuttgart, Germany, 1993), p. 593.
M. J. Hoffmann and G. Petzow, in Silicon Nitride Ceramics: Scientific and Technological Advances, edited by I-W. Chen, P. F. Becher, M. Mitomo, G. Petzow, and T-S. Yen (Mater. Res. Soc. Symp. Proc. 287, Pittsburgh, PA, 1993), p. 3.
R. Marchand, A. Jayaweera, P. Verdier, and J. Lang, C. R. Acad. Sci. Paris, Ser. C 283, 675 (1976).
R. R. Wills, R. W. Stewart, J. A. Cunningham, and J. M. Wimmer, J. Mater. Sci. 11, 749 (1976).
Y. Cheng and D. P. Thompson, J. Am. Ceram. Soc. 77, 143 (1994).
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Klein, J.D., Clauson, S.L. & Cogan, S.F. Reactive IrO2 sputtering in reducing/oxidizing atmospheres. Journal of Materials Research 10, 328–333 (1995). https://doi.org/10.1557/JMR.1995.0328
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DOI: https://doi.org/10.1557/JMR.1995.0328