Abstract
An amorphous SiO2 substrate was co-implanted with 175 keV Mo+ and 74 keV S+ ions at doses of 4.97 × 1016 and 1.02 × 1017 cm−2, respectively. Energies of the Mo+ and S+ ions were chosen to obtain nearly overlapping depth profiles. Transmission electron microscopy and Rutherford backscattering techniques were used to characterize the ion-implanted materials. The formation of a MoS2 phase was observed in the as-implanted condition. Annealing of the as-implanted material was performed in an oxygen-free atmosphere as well as in air. The MoS2 phase remained stable at 700 °C for 8 h in an oxygen-free atmosphere whereas it starts oxidizing in air at 600 °C for 2 h. Results are discussed in terms of the available data on the oxidation of MoS2 coatings.
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References
I. L. Singer, in New Materials Approaches to Tribology: Theory and Applications, edited by L. E. Pope, L. L. Fehrenbacher, and W. O. Winer (Mater. Res. Soc. Symp. Proc. 140, Pittsburgh, PA, 1989), p. 215.
S. Ramalingam, in New Materials Approaches to Tribology: Theory and Applications, edited by L. E. Pope, L. L. Fehrenbacher, and W. O. Winer (Mater. Res. Soc. Symp. Proc. 140, Pittsburgh, PA, 1989), p. 465.
H. E. Sliney, Tribo. Inter. 15, 303 (1982).
M.R. Hilton and P.D. Fleischauer, J. Mater. Res. 5, 406 (1990); P. D. Fleischauer, ASLE Trans. 27, 82 (1984).
G. Dearnaley, Rad. Eff. 63, 1 (1982).
A. K. Rai, R. S. Bhattacharya, S. C. Kung, and D. Patrizio, in Beam-Solid Interactions: Physical Phenomena, edited by J. A. Knapp, P. Borgesen, and R.A. Zuhr (Mater. Res. Soc. Symp. Proc. 157, Pittsburgh, PA, 1990), p. 549; A.K. Rai, R.S. Bhattacharya, and S. C. Kung, J. Appl. Phys. 68, 5169 (1990).
R. S. Bhattacharya, A. K. Rai, and V. Aronov, Tribology Trans. 34, 472 (1991).
Powder Diffraction File (JCPDS International Center for Diffraction Data, Swarthmore, PA, 1983; 6-0097).
J. A. Martin, J. B. Cross, and L. E. Pope, in New Materials Approaches to Tribology: Theory and Applications, edited by L. E. Pope, L. Fehrenbacher, and W. O. Winer (Mater. Res. Soc. Symp. Proc. 140, Pittsburgh, PA, 1989), p. 271.
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Rai, A.K., Bhattacharya, R.S. Co-implantation of Mo+ and S+ in SiO2. Journal of Materials Research 6, 2375–2380 (1991). https://doi.org/10.1557/JMR.1991.2375
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DOI: https://doi.org/10.1557/JMR.1991.2375