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Titanium disulfide thin film prepared by plasma CVDa)

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Abstract

Titanium disulfide films were prepared by plasma CVD. Crystalline orientation of layered TiS2 was investigated in relation to deposition rate, film thickness, and kinds of substrate. The preferred orientation of TiS2 basal plane perpendicular to substrates was obtained on the films with their thickness of more than ca. 10 μm at the deposition rate of ca. 4 ⊠ 10−3 g/cm2·h on all kinds of substrate. This orientation resulted in a large discharge capacity in a lithium battery cathode application.

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References

  1. T. Ito and T. Nakajima, Philos. Mag. B 37, 773 (1978).

    Article  CAS  Google Scholar 

  2. T. B. Stewart and P. D. Fleischauer, Inorg. Chem. 21, 2426 (1982).

    Article  CAS  Google Scholar 

  3. T. Spalvins, Thin Solid Films 96, 17 (1982).

    Article  CAS  Google Scholar 

  4. V. Buck, Wear 91, 281 (1983).

    Article  CAS  Google Scholar 

  5. V. Buck, Vacuum 36, 89 (1986).

    Article  CAS  Google Scholar 

  6. V. Buck, Thin Solid Films 139, 157 (1986).

    Article  CAS  Google Scholar 

  7. P. D. Fleischauer, Thin Solid Films 154, 309 (1987).

    Article  CAS  Google Scholar 

  8. J. R. Lince and P. D. Fleischauer, J. Mater. Res. 2, 827 (1987).

    Article  CAS  Google Scholar 

  9. R. Shimanouchi, T. Yamamoto, S. Kikkawa, and M. Koizumi, Chem. Lett., 1323 (1985).

  10. S. Kikkawa, R. Shimanouchi-Futagami, and M. Koizumi, Appl. Phys. A49, 105 (1989).

    Article  Google Scholar 

  11. K. Kanehori, Y. Ito, F. Kirino, K. Miyauchi, and T. Kudo, Solid State Ionics 18/19, 818 (1986).

    Article  Google Scholar 

  12. M. S. Whittingham, Prog. Solid State Chem. 12, 41 (1978).

    Article  CAS  Google Scholar 

  13. S. Kikkawa, M. Miyazaki, Y. Liu, and F. Kanamaru, Solid State Ionics (in press).

  14. T. Yamamoto, S. Kikkawa, and M. Koizumi, J. Electrochem. Soc. 131, 1343 (1984).

    Article  CAS  Google Scholar 

  15. D.W. Murphy and F.A. Trumbore, J. Cryst. Growth 39, 185 (1977).

    Article  CAS  Google Scholar 

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Authors and Affiliations

  1. The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, 567, Osaka, Japan

    S. Kikkawa & M. Miyazaki

  2. Faculty of Science and Technology, Ryukoku University, Ohtsu, 520-21, Shiga, Japan

    M. Koizumi

Authors
  1. S. Kikkawa
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  2. M. Miyazaki
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  3. M. Koizumi
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Kikkawa, S., Miyazaki, M. & Koizumi, M. Titanium disulfide thin film prepared by plasma CVDa). Journal of Materials Research 5, 2894–2901 (1990). https://doi.org/10.1557/JMR.1990.2894

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  • DOI: https://doi.org/10.1557/JMR.1990.2894

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