Abstract
Abstract
The possibility that an adsorbed molecule could provide shallow electronic states that could be thermally excited has received less attention than substitutional impurities and could potentially have a high impact in the doping of silicon nanowires (SiNWs). We show that molecular-based ex-situ doping, where NH3 is adsorbed at the sidewall of the SiNW, can be an alternative path to n-type doping. By means of first-principle electronic structure calculations, we show that NH3 is a shallow donor regardless of the growth orientation of the SiNWs. Also, we discuss quantum confinement and its relation with the depth of the NH3 doping state, showing that the widening of the bandgap makes the molecular donor level deeper, thus more difficult to activate.
Background
Semiconductor nanowires exhibit a variety of unique material properties, including mechanical flexibility, size-dependent optical and electronic properties, and solution processability. In particular, silicon nanowires (SiNWs) have been explored and studied both theoretically [1] and experimentally [2] for a long time, and they have attracted much attention for many applications, such as bipolar and field-effect transistors [3–5], nanosensors [3, 6], solar cells [7, 8], and energy conversion devices [9, 10], but controlled doping with electronic and magnetic impurities remains an important challenge [11–14]. While developing these applications, it is important to control the electrical and optical properties of nanowires (NWs), which strongly depend on the diameter as well as the crystallographic orientation [15] and defect structure of the NWs [16]. There are several ways that the electronic structure of SiNWs can be modified, for example, by changing the thickness, orientation, surface morphology, hydrogen concentration, and doping [1, 2]. Reduced-dimensionality systems are characterized by a large surface-to-bulk ratio and offer the possibility of doping through the external adsorption of molecules [17] rather than the incorporation of substitutional impurities [18].
The increase in graphene carrier mobility induced by absorbed gas molecules has been recently used as a highly sensitive solid-state sensor capable of detecting individual molecules [17, 19]. This has motivated molecular doping calculations in graphene [20, 21], where the vanishing bandgap makes it easier to find molecular adsorbates whose HOMO (LUMO) falls in the host conduction (valence) band. Also, adsorption of NH3 and NO2 has been predicted to occur in carbon nanotubes [22], where charge transfer and gas-induced charge fluctuations should affect significantly the transport properties of single-walled carbon nanotubes [23], in agreement with the experimental results of Kong [24].
In SiNWs, the possibility that an adsorbed molecule could provide shallow electronic states has received less attention, though some promising experimental results have been recently reported [25, 26]. This is relevant because traditional substitutional dopants in Si have too large activation energies in thin SiNWs [27, 28]. On the other hand, many experimental results have been obtained with mesoporous Si (meso-PSi) [29–31], where electrochemical attack of a Si sample yields a disordered network of single-crystalline Si wires. In the work of Garrone et al. [32], n- and p-type doping was achieved by the exposure of meso-PSi to NH3 and NO2, respectively.
Some of us have recently studied the chemisorption of NH3 and NO2 on SiNWs [33], reporting n- and p-type doping of a SiNW with dangling bonds upon gas exposure. That work, however, was restricted to the {110} facet of a [111] SiNW. Focusing on NH3 the present work will show that those conclusions can be extended to SiNWs grown along other low index orientations, with the molecule sticking to facets of any crystallographic orientation. We will also consider the effect of the diameter of the NW since it is not obvious whether the impurity state introduced by the dopant molecule will be subject to the effects of quantum confinement.
Methods
All of our ab initio calculations were performed with the Siesta code [34], which implements density functional theory (DFT). We use norm-conserving pseudopotentials for the core electrons and expand the one-electron wane function of the valence electron with a double-ζ basis set plus polarization functions [35]. The exchange correlation energy is calculated within the generalized gradient approximation (GGA) in the parametrization of Perdew-Burke-Ernzerhof [36]. We consider silicon nanowires hydrogenated with a diameter of approximately 1.5 nm grown along the [112],[110],[001], and [111] directions, common growth orientations that have been observed experimentally to date [37, 38]. The geometrical structures of freestanding NWs are shown in Figure 1 and have been relaxed until all the forces were lower than 0.04 eV/Å. We study NH3 molecular doping of silicon nanowires in the [112],[110],[001], and [111] directions, using supercells made of three, five, three, and two primitive cells, respectively, to allow neglecting the spurious interaction with the periodic image of the molecule and to obtain converged results of the total energies [39]. Also, we study the effect of quantum confinement of NH3 chemisorbed on 1.0-, 1.5-, and 2.0-nm-thick [111] SiNWs, supercells made of three primitive cells. The Brillouin zone has been sampled with a 1×1×2 grid of k-points within the Monkhorst-Pack algorithm [40].
Results and discussion
We study NH3 adsorption on 1.5-nm SiNWs grown along the [112],[110],[001], and [111] orientations (see Figure 1) as well as at different facets such as {110}, {100}, and {111}. Like in the case of Miranda-Durán et al. [33], we focus on the chemistry of the dangling bond (DB)-molecule complex, trying to assess a possible dependence on the facet orientation, considering this as the most effective adsorption mechanism.
We have found that all the adsorption processes considered are favored, with the N bonding the unpaired electron of the Si DB. Chemisorption energies are shown in Table 1, from which we see that NH3 molecules will always bind to available dangling bonds. Subsequent desorption at room temperature will be substantially suppressed, as binding energies are, at least, of the order of 8 k B T, with {110} facets being the ones providing the most stable binding.
In Figure 2, we plot the band structure corresponding to the adsorption of an NH3 molecule at the DB of the {110} facet for all the growth orientation considered. The formation of the DB-molecule complex yields a shallow molecular state close to the conduction band edge, thus resulting in n-type doping, similar to what we previously reported [33]. Therefore, NH3 is found to be an efficient donor, with carriers that can be thermally excited into the conduction band. The efficiency of the doping process is, at first approach, independent on the wire growth orientation. Band structures of the less favored, but possible, adsorption mechanisms, i.e., at sidewalls other than the {110} facet (Figure 3), are shown in Figure 4. The conclusions are qualitatively the same, although in the cases shown, the molecular state is somewhat deeper than for the adsorption at {110} facets. Shallower states will be recovered at slightly larger diameters (see the discussion on quantum confinement below). These results suggest that NH3 can act as a donor agent, a conclusion also corroborated by experimental results [32]. It should be kept in mind that SiNWs in this size range, for instance, have been shown to have calculated bandgaps within GGA that are 0.6 to 0.8 eV smaller than GW or DFT hybrid functional calculations [41, 42], which are close to experimental results [37]. Also, as discussed recently by Niquet et al. [43], density functional calculations, at least within the local and semilocal approximations to the exchange-correlation functionals, only allow a qualitative inspection of this kind of systems, and a many-body treatment is required for a quantitative estimation of the dopant binding energy. For these reasons, it cannot be guaranteed that the estimation of the molecular state depth is quantitatively accurate, and beyond DFT calculations are needed to clarify this point. Therefore, the results presented here should be taken to be qualitative.
Electronic band structure and projected DOS with NH 3 adsorbed at a {110} facet. Electronic band structures, NH3 adsorption yield n-type doping, pining the Fermi level at the bottom of the conduction band (left panels) for SiNWs along the (a) [112], (b) [110], (c) [001], and (d) [111] directions. The projected DOS (right panels) illustrates the contribution of the molecular orbitals.
Electronic band structure and projected DOS with NH 3 adsorbed at facets other than {110}. Electronic band structures, NH3 adsorption yields n-type doping, pining the Fermi level at the bottom of the conduction band (left panels) for SiNWs along the (a) [112], (b) [110], and (c) [001], directions. The projected DOS (right panels) illustrates the contribution of the molecular orbitals.
Next, we study the effect of the wire diameter. For this, we have considered NH3 adsorption on three different hydrogenated SiNWs with diameters of 1.0, 1.5, and 2.0 nm grown along the [111] orientation and bounded by {110} facets (see Figure 5). These small diameters yield a sizeable quantum confinement effect [41], which leads to the widening of the electronic bandgap. The electronic band structures of the adsorbed configurations of Figure 5 are shown in Figure 6. In the smaller diameter SiNW (Figure 5a), with a bigger bandgap, NH3 adsorption yields a deep state, as illustrated by Figure 6a. On the other hand, we obtain for the 1.5-nm NW that the adsorbed molecule contributes with a localized shallow state close to the conduction band edge, where it pins the Fermi level (see Figure 6b), similar to the case of conventional substitutional dopants for bulk Si, such as P. In the limit of a large diameter SiNW, the NH3 donor state falls at the conduction band edge, as shown in Figure 6c, thus confirming that in larger NWs, where the bandgap is smaller due to a reduced quantum confinement; this state is shallow enough to be an active electron donor.
Electronic band structure and projected DOS for NH 3 adsorption on a [111]-oriented SiNW Electronic band structures (left panels), showing a deep state, a donor shallow state close to the conduction band edge and a donor state fell inside the conduction band for ( a ) 1. 0-, (b) 1.5-, and (c) 2.0-nm-thick SiNWs, respectively. The projected DOS (right panels) illustrates the contribution of the molecular orbitals.
Conclusions
In summary, we have reported electronic structure calculations of the adsorption of NH3 onto SiNWs grown along the [112],[110],[001], and [111] orientations, considering adsorption at dangling bonds located at {110}, {100}, and {111} facets, where applicable. We recover the main feature reported in the experiments that NH3 is a donor in nanostructured Si, extending the conclusions reported in the study of Miranda-Durán et al. [33], where only one specific adsorption configuration was considered. We have found that NH3 is more strongly bound to {110} facets, regardless of the growth orientation of the SiNWs. On the other hand, quantum confinement effects turn the shallow impurity level into a deep one as the SiNW diameter is decreased. All these observations suggest that NH3 can be used as an active n-type dopant in thin SiNWs.
Abbreviations
- Db:
-
dangling bond
- DFT:
-
density functional theory
- GGA:
-
generalized gradient approximation
- NWs:
-
nanowires
- SiNWs:
-
silicon nanowires.
References
Rurali R: Colloquium: structural, electronic, and transport properties of silicon nanowires. Rev Mod Phys 2010, 82: 427. 10.1103/RevModPhys.82.427
Schmidt V, Wittemann JV, Gösele U: Growth, thermodynamics, and electrical properties of silicon nanowires. Chem Rev 2010, 110: 361. 10.1021/cr900141g
Cui Y, Wei Q, Park H, Lieber CM: Nanowire nanosensors for highly sensitive and selective detection of biological and chemical species. Science 2001, 293: 1289. 10.1126/science.1062711
Jang M, Park Y, Jun M, Hyun Y, Choi SJ, Zyung T: The characteristics of Seebeck coefficient in silicon nanowires manufactured by CMOS compatible process. Nanoscale Res Lett 2010, 5: 1654. 10.1007/s11671-010-9690-2
Moraru D, Udhiarto A, Anwar M, Nowak R, Jablonski R, Hamid E, Tarido JC, Mizuno T, Tabe M: Atom devices based on single dopants in silicon nanostructures. Nanoscale Res Lett 2011, 6: 479. 10.1186/1556-276X-6-479
Stern E, Klemic JF, Routenberg DA, Wyrembak PN, Turner-Evans DB, Hamilton AD, LaVan DA, Fahmy TM, Reed MA: Label-free immunodetection with CMOS-compatible semiconducting nanowires. Nature 2007, 445: 519. 10.1038/nature05498
Tian B, Zheng X, Kempa TJ, Fang Y, Yu N, Yu G, Huang J, Lieber CM: Coaxial silicon nanowires as solar cells and nanoelectronic power sources. Nature 2007, 449: 885. 10.1038/nature06181
Ossicini S, Amato M, Guerra R, Palummo M, Pulci O: Silicon and germanium nanostructures for photovoltaic applications: ab-initio results. Nanoscale Res Lett 2010, 5: 1637. 10.1007/s11671-010-9688-9
Hochbaum AI, Chen R, Diaz-Delgado R, Liang W, Garnett EC, Najarian M, Majumdar A, Yang P: Enhanced thermoelectric performance of rough silicon nanowires. Nature 2008, 451: 163. 10.1038/nature06381
Boukai AI, Bunimovich Y, Tahir-Kheli J, Yu JK, Goddard-III WA, Heath JR: Silicon nanowires as efficient thermoelectric materials. Nature 2008, 451: 168. 10.1038/nature06458
Cui Y, Duan X, Hu J, Lieber CM: Doping and electrical transport in silicon nanowires. J Phys Chem B 2000, 104: 5213.
Gudiksen MS, Lauhon LJ, Wang J, Smith DC, Lieber CM: Growth of nanowire superlattice structures for nanoscale photonics and electronics. Nature 2002, 415: 617. 10.1038/415617a
Lew KK, Pan L, Bogart TE, Dilts SM, Dickey EC: Structural and electrical properties of trimethylboron-doped silicon nanowires. Appl Phys Lett 2004, 85: 3101. 10.1063/1.1792800
Radovanovic PV: Keeping track of dopants. Nature Nanotechnol 2009, 4: 282. 10.1038/nnano.2009.104
Holmes JD, Johnston KP, Doty RC, Korgel BA: Control of thickness and orientation of solution-grown silicon nanowires. Science 2000, 287: 1471. 10.1126/science.287.5457.1471
Mozos JL, Machado E, Hernandez E, Ordejon P: Nanotubes and nanowires: the effect of impurities and defects on their electronic properties. Int J Nanotechnol 2005, 2: 114.
Schedin F, Geim AK, Morozov SV, Hill EW, Blake P, Katsnelson MI, Nonoselov KS: Detection of individual gas molecules adsorbed on graphene. Nature Mater 2007, 6: 652. 10.1038/nmat1967
Durgun E, Akman N, Ataca C, Ciraci S: Atomic and electronic structures of doped silicon nanowires: a first-principles study. Phys Rev B 2007, 76: 245323.
Romero HE, Joshi P, Gupta AK, Gutierrez HR, Cole MW, Tadigadapa SA, Eklund PC: Adsorption of ammonia on graphene. Nanotechnology 2009, 20: 245501. 10.1088/0957-4484/20/24/245501
Leenaerts O, Partoens B, Peeters FM: Adsorption of H2O, NH3, CO, NO2, and NO on graphene: a first-principles study. Phys Rev B 2008, 77: 125416.
Wehling TO, Novoselov KS, Morozov SV, Vdovin EE, Katsnelson MI, Geim AK, Lichtenstein AI: Molecular doping of graphene. Nano Lett 2008, 8: 173. 10.1021/nl072364w
Chang H, Lee JD, Lee SM, Lee YH: Adsorption of NH3 and NO2 molecules on carbon nanotubes. Appl Phys Lett 2001, 79: 3863. 10.1063/1.1424069
Zhao J, Buldum A, Han J, Lu JP: Gas molecule adsorption in carbon nanotubes and nanotube bundles. Nanotechnology 2002, 13: 195. 10.1088/0957-4484/13/2/312
Kong J, Franklin NR, Zhou C, Chapline MG, Peng S, Cho K, Dai H: Nanotube molecular wires as chemical sensors. Science 2000, 287: 622–625. 10.1126/science.287.5453.622
Yuan GD, Zhou YB, Guo CS, Zhang WJ, Tang YB, Li YQ, Chen ZH, He ZB, Zhang XJ, Wang PF, Bello I, Zhang RQ, Lee CS, Lee ST: Tunable electrical properties of silicon nanowires via surface-ambient chemistry. ACS Nano 2010, 4: 3045–3052. 10.1021/nn1001613
Guo CS, Luo LB, Yuan GD, Yang XB, Zhang RQ, Zhang WJ, Lee ST: Surface passivation and transfer doping of silicon nanowires. Angew Chem Int Edit 2009, 48: 9896–9900. 10.1002/anie.200904890
Diarra M, Niquet YM, Delerue C, Allan G: Ionization energy of donor and acceptor impurities in semiconductor nanowires: importance of dielectric confinement. Phys Rev B 2007, 75: 045301.
Rurali R, Cartoixà X: Theory of defects in one-dimensional systems: application to Al-catalyzed Si nanowires. Nano Lett 2009, 9: 975–979. 10.1021/nl802847p
Cullis AG, Canham LT: Visible light emission due to quantum size effects in highly porous crystalline silicon. Nature 1991, 353: 335. 10.1038/353335a0
Cullis AG, Calcott PDJ, Canham L T: The structural and luminescence properties of porous silicon. J Appl Phys 1997, 82: 909. 10.1063/1.366536
Bisi O, Ossicini S, Pavesi L: Porous silicon: a quantum sponge structure for silicon based optoelectronics. Surf Sci Rep 2000, 38: 1. 10.1016/S0167-5729(99)00012-6
Garrone E, Geobaldo F, Rivolo P, Amato G, Boarino L, Chiesa M, Giamello E, Gobetto R, Ugliengo R, Viale A: A nanostructured porous silicon near insulator becomes either a p- or an n-type semiconductor upon gas adsorption. Adv Mater 2005, 17: 528. 10.1002/adma.200401200
Miranda-Durán A, Cartoixà X, Cruz-Irisson M, Rurali R: Molecular doping and subsurface dopant reactivation in Si nanowires. Nano Lett 2010, 10: 3590. 10.1021/nl101894q
Soler JM, Artacho E, Gale JD, García A, Junquera J, Ordejón P, Sánchez-Porta D: The SIESTA method for ab initio order-N materials simulation. J Phys: Condens Matter 2002, 14: 2745. 10.1088/0953-8984/14/11/302
Anglada E, Soler JM, Junquera J, Artacho E: Systematic generation of finite-range atomic basis sets for linear-scaling calculations. Phys Rev B 2002, 66: 205101.
Perdew JP, Burke K, Ernzerhof M: Generalized gradient approximation made simple. Phys Rev Lett 1996, 77: 3865. 10.1103/PhysRevLett.77.3865
Ma DDD, Lee CS, Au FCK, Tong SY, T LS: Small-diameter silicon nanowires surfaces. Science 2003, 299: 1874. 10.1126/science.1080313
Irrera A, Pecora EF, Priolo F: Control of growth mechanisms and orientation in epitaxial Si nanowires grown by electron beam evaporation. Nanotechnology 2009, 20: 135601. 10.1088/0957-4484/20/13/135601
Rurali R, Palummo M, Cartoixà X: Convergence study of neutral and charged defect formation energies in Si nanowires. Phys Rev B 2010, 81: 235304.
Monkhorst HJ, Pack JD: Special points for Brillouin-zone integrations. Phys Rev B 1976, 13: 5188. 10.1103/PhysRevB.13.5188
Bruno M, Palummo M, Marini A, Del Sole R, Ossicini S: From Si nanowires to porous silicon: the role of excitonic effects. Phys Rev Lett 2007, 98(3):036807.
Rurali R, Aradi B, Frauenheim T, Gali A: Accurate single-particle determination of the band gap in silicon nanowires. Phys Rev B 2007, 76: 113303.
Niquet YM, Genovese L, Delerue C, Deutsch T: Ab initio calculation of the binding energy of impurities in semiconductors: application to Si nanowires. Phys Rev B 2010, 81: 161301(R).
Acknowledgements
We acknowledge the financial support or funding under contract numbers TEC2009-06986, FIS2009-12721-C04-03, and CSD2007-00041 and Postdoctoral Abroad - Consejo Nacional de Ciencia y Tecnología, México.
Author information
Authors and Affiliations
Corresponding author
Additional information
Competing interests
The authors declare that they have no competing interests.
Authors’ contributions
AM carried out the calculations, participated in the sequence alignment, and drafted the manuscript. XC participated in the sequence alignment and drafted the manuscript. EC participated in the sequence alignment and drafted the manuscript. RR participated in the sequence alignment and drafted the manuscript. All authors read and approved the final manuscript.
Authors’ original submitted files for images
Below are the links to the authors’ original submitted files for images.
Rights and permissions
Open Access This article is distributed under the terms of the Creative Commons Attribution 2.0 International License (https://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
About this article
Cite this article
Miranda, Á., Cartoixà, X., Canadell, E. et al. NH3 molecular doping of silicon nanowires grown along the [112], [110], [001], and [111] orientations. Nanoscale Res Lett 7, 308 (2012). https://doi.org/10.1186/1556-276X-7-308
Received:
Accepted:
Published:
DOI: https://doi.org/10.1186/1556-276X-7-308
Keywords
- Silicon nanowires
- Ammonia
- Molecular doping
- DFT
- Electronic properties
- Gas sensing