Abstract
This paper reports on an improvement of the calorimetric method for the determination of energy fluxes from plasma towards substrates by using a transient technique. It provides a short overview of the traditional method used for characterization of plasma-wall-interactions during plasma processing. The mathematical framework of the method and possible implications are discussed. It is shown how the method can be improved to obtain additional and detailed information about the energy influx in a shorter measurement time. For this purpose, the probe bias (if applied), which has commonly been kept constant is varied like in Langmuir probe measurements. The experimental validation of the theoretical considerations emphasizes the potential of the method for control in plasma processing. The possibility how the passive calorimetric probe can be used in continuous measurements for process monitoring without any feedback loops used by other probes, is finally discussed.
Similar content being viewed by others
References
Low Temperature Plasmas: Fundamentals, Technologies and Techniques, edited by R. Hippler, H. Kersten, M. Schmidt, K.H. Schoenbach (Wiley-VCH, 2008)
J.A. Thornton, J. Vac. Sci. Technol. 11, 666 (1974)
G. Mah, P.S. McLeod, D.G. Williams, J. Vac. Sci. Technol. 11, 663 (1974)
R.D. Bland, G.J. Kominiak, D.M. Mattox, J. Vac. Sci. Technol. 11, 671 (1974)
H. Kersten, G.M.W. Kroesen, R. Hippler, Thin Solid Films 332, 282 (1998)
J.M. Andersson, E. Wallin, E.P. Münger, U. Helmersson, J. Appl. Phys. 100, 033305 (2006)
D.J. Ball, J. Appl. Phys. 43, 3047 (1972)
J.A. Thornton, Thin Solid Films 54, 23 (1978)
G. Makrinich, A. Fruchtman, J. Appl. Phys. 100, 093302 (2006)
R. Piejak, V. Godyak, B. Alexandrovich, N. Tishchenko, Plasma Sources Sci. Technol. 7, 590 (1999)
H. Kersten, D. Rohde, J. Berndt, H. Deutsch, R. Hippler, Thin Solid Films 377, 585 (2000)
E. Stamate, H. Sugai, K. Ohe, Appl. Phys. Lett. 80, 3066 (2002)
S.D. Ekpe, S.K. Dew, J. Vac. Sci. Technol. A 22, 1420 (2004)
C. Paturaud, G. Farges, M.C. Sainte Catherine, J. Machet, Surf. Coat. Technol. 98, 1257 (1998)
T.P. Drüsedau, T. Bock, T.M. John, F. Klabunde, W. Eckstein, J. Vac. Sci. Technol. A 17, 2896 (1999)
M. Čada, P. Virostko, Š. Kment, Z. Hubička, Plasma Process. Polym. 6, S247 (2009)
T.P. Drüsedau, K. Koppenhagen, Surf. Coat. Technol. 153, 155 (2002)
S. Bornholdt, T. Peter, T. Strunskus, V. Zaporojtchenko, F. Faupel, H. Kersten, Surf. Coat. Technol. 205, 388 (2011)
S. Bornholdt, J. Ye, S. Ulrich, H. Kersten, J. Appl. Phys. 112, 123301 (2012)
D. Lundin, M. Stahl, H. Kersten, U. Helmersson, J. Phys. D 42, 185202 (2009)
V. Stranak, M. Cada, Z. Hubicka, M. Tichy, R. Hippler, J. Appl. Phys. 108, 043305 (2010)
W.P. Leroy, S. Konstantinidis, S. Mahieu, R. Snyders, D. Depla, J. Phys. D 44, 115201 (2011)
P.A. Cormier, A. Balhamri, A.L. Thomann, R. Dussart, N. Semmar, J. Mathias, R. Snyders, S. Konstantinidis, J. Appl. Phys. 113, 013305 (2013)
H. Kersten, G.M.W. Kroesen, Contrib. Plasma Phys. 30, 725 (1990)
H. Kersten, D. Steffen, D. Vender, H.E. Wagner, Vacuum 46, 305 (1995)
H. Kersten, D. Rohde, H. Steffen, H. Deutsch, R. Hippler, G. Swinkels, G.M.W. Kroesen, Appl. Phys. A: Mater. Sci. Process. 72, 531 (2001)
H. Kersten, E. Stoffels, W.W. Stoffels, M. Otte, C. Csambal, H. Deutsch, R. Hippler, J. Appl. Phys. 87, 3637 (2000)
R. Dussart, A.L. Thomann, L.E. Pichon, L. Bedra, N. Semmar, P. Lefaucheux, J. Mathias, Y. Tessier, Appl. Phys. Lett. 93, 131502 (2008)
M. Wolter, M. Stahl, H. Kersten, Vacuum 83, 768 (2008)
M. Wolter, M. Stahl, H. Kersten, Plasma Process. Polym. 6, S626 (2009)
M. Stahl, T. Trottenberg, H. Kersten, Rev. Sci. Instrum. 81, 023504 (2010)
C. Roth, A. Spillmann, A. Sonnenfeld, P. Rudolf von Rohr, Plasma Process. Polym. 6, S566 (2009)
C. Roth, S. Bornholdt, V. Zuber, A. Sonnenfeld, H. Kersten, P. Rudolf von Rohr, J. Appl. Phys. 44, 095201 (2010)
C. Roth, G. Oberbossel, P. Rudolf von Rohr, J. Phys. D 45, 355202 (2012)
E. Stoffels, R.E.J. Sladek, I.E. Kieft, H. Kersten, R. Wiese, Plasma Phys. Control. Fusion 46, B167 (2004)
S. Bornholdt, M. Wolter, H. Kersten, Eur. Phys. J. D 60, 653 (2010)
S.A. Khrapak, G.E. Morfill, Phys. Plasmas 13, 104506 (2006)
H. Maurer, R. Basner, H. Kersten, Rev. Sci. Instrum. 79, 093508 (2008)
G. Golan, A. Axelevitch, J. Optoelectron. Adv. Mater. 5, 1417 (2003)
J. Schulze, E. Schüngel, U. Czarnetzki, J. Phys. D 42, 092005 (2009)
S. Bornholdt, N. Itagki, K. Kuwahara, H. Wulff, M. Shiratani, H. Kersten, Plasma Sources Sci. Technol. 22, 025019 (2013)
R. Wiese, H. Kersten, G. Wiese, M. Häckel, Vakuum Forschung Praxis 23, 20 (2011)
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Bornholdt, S., Kersten, H. Transient calorimetric diagnostics for plasma processing. Eur. Phys. J. D 67, 176 (2013). https://doi.org/10.1140/epjd/e2013-40148-8
Received:
Revised:
Published:
DOI: https://doi.org/10.1140/epjd/e2013-40148-8