Abstract
Nanostructured films in the TiB2-TiN and TiB2-B4C systems were prepared by nonreactive magnetron sputtering both with the application of an additional external magnetic field and without it. The grain sizes, the phase composition, the preferred texture, the surface roughness, and the hardness of the deposited films were examined using a number of methods, such as transmission electron microscopy, microdiffraction, X-ray powder diffraction, atomic-force microscopy, and microdurometry. The specific features of the phase diagrams of the films prepared were discussed in terms of the nanosized state, the influence of a magnetic field strength, and the role of different factors in the formation of the properties of the films.
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Original Russian Text © R.A. Andrievski, G.V. Kalinnikov, 2007, published in Fizika i Khimiya Stekla.
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Andrievski, R.A., Kalinnikov, G.V. Specific phase features of nanostructured films based on titanium diboride. Glass Phys Chem 33, 344–349 (2007). https://doi.org/10.1134/S1087659607040074
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DOI: https://doi.org/10.1134/S1087659607040074