Abstract
Technetium carbonyl complexes [TcBr(CO)5], [TcI(CO)5], [TcX(CO)3]4 (X = Cl, Br, I), [TcBr(CO)3en] (en = ethylenediamine), [Tc(RCOCHCOR′)(CO)3(Et2NH)] [R = CH3 or C(CH3)3, R′ = CF3], Tc2(CO)10, and [Tc(C5H5)(CO)3] were tested as starting compounds for chemical vapor deposition of technetium coatings. The conditions of deposition of technetium coatings were determined, and the deposition yields were evaluated.
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Original Russian Text © G.V. Sidorenko, A.E. Miroslavov, D.N. Suglobov, 2009, published in Radiokhimiya, 2009, Vol. 51, No. 6, pp. 503–508.
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Sidorenko, G.V., Miroslavov, A.E. & Suglobov, D.N. Vapor deposition of technetium coatings by thermolysis of volatile carbonyl complexes: I. Conditions and efficiency of coating deposition from various starting compounds. Radiochemistry 51, 576–582 (2009). https://doi.org/10.1134/S1066362209060046
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DOI: https://doi.org/10.1134/S1066362209060046