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Technologies for Forming Electrodynamic Structures for Millimeter-Wave and Terahertz Vacuum Microelectronic Devices (Review)

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Abstract

The electrodynamic microstructure technologies for production of millimeter and submillimeter-wave vacuum microelectronic devices are reviewed, including photolithography, deep reactive ion etching, computer numerical control micro- and nanomilling, electro-erosive micromachining, and additive technologies: 3D printing, selective laser sintering, and selective laser melting. An original approach to manufacture of planar slow-wave systems based on magnetron sputtering and laser ablation is discussed. Technological tolerances and surface roughness that can be obtained using the considered technologies are compared.

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Notes

  1. The LIGA acronym owes its origin to the German names of the main process stages: lithography (Lithographie), electroforming (Galvanoformung), and molding (Abformung).

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Funding

This work was supported by the Russian Science Foundation (Production and Study of 3D Printed Structures), project no. 22-12-00181 and the Russian Foundation for Basic Research (Laser Ablation Production and Study of Structures), project no. 20-07-00929.

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Authors and Affiliations

  1. Chernyshevsky Saratov State University, 410012, Saratov, Russia

    A. V. Starodubov, D. A. Nozhkin, I. I. Rasulov, A. A. Serdobintsev, I. O. Kozhevnikov, V. V. Galushka & N. M. Ryskin

  2. Kotelnikov Institute of Radioengineering and Electronics, Saratov Branch, Russian Academy of Sciences, 410038, Saratov, Russia

    A. V. Starodubov, V. V. Galushka, V. K. Sakharov & N. M. Ryskin

  3. Gagarin Saratov State Technical University, 410054, Saratov, Russia

    D. A. Bessonov

  4. Laser Center, 195067, St. Petersburg, Russia

    A. D. Galkin

  5. Institute of Solid State Physics, Russian Academy of Sciences, 142432, Chernogolovka, Moscow oblast, Russia

    I. Sh. Bakhteev & S. Yu. Molchanov

  6. Skolkovskiy Institute of Spectroscopy, Russian Academy of Sciences, 108840, Moscow, Russia

    S. V. German

  7. Institute of Science and Technology, 121205, Moscow, Russia

    S. V. German

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  1. A. V. Starodubov
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  2. D. A. Nozhkin
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  3. I. I. Rasulov
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  4. A. A. Serdobintsev
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  5. I. O. Kozhevnikov
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  6. V. V. Galushka
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  7. V. K. Sakharov
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  8. D. A. Bessonov
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  9. A. D. Galkin
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  10. I. Sh. Bakhteev
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  11. S. Yu. Molchanov
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  12. S. V. German
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  13. N. M. Ryskin
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Correspondence to A. V. Starodubov.

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Translated by E. Bondareva

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Starodubov, A.V., Nozhkin, D.A., Rasulov, I.I. et al. Technologies for Forming Electrodynamic Structures for Millimeter-Wave and Terahertz Vacuum Microelectronic Devices (Review). J. Commun. Technol. Electron. 67, 1189–1197 (2022). https://doi.org/10.1134/S1064226922100126

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