Abstract
The effect of irradiation with H+ and Ne+ ions with an energy of 150 keV on memristive Au/SiO x /TiN/Ti structures, which were obtained by magnetron sputtering and exhibited a reproducible resistive switching effect, is studied. It is demonstrated that the low and high resistance states remain unchanged up to a dose of 1 × 1016 cm–2 in the case of irradiation with H+ ions and a dose of ~3 × 1015 cm–2 under irradiation with Ne+ ions. The obtained results demonstrate the high tolerance of parameters of the studied memristive structures to both ionizing radiation and displacement damage.
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Original Russian Text © A.I. Belov, A.N. Mikhaylov, D.S. Korolev, V.A. Sergeev, E.V. Okulich, I.N. Antonov, A.P. Kasatkin, E.G. Gryaznov, A.P. Yatmanov, O.N. Gorshkov, D.I. Tetelbaum, 2015, published in Pis’ma v Zhurnal Tekhnicheskoi Fiziki, 2015, Vol. 41, No. 19, pp. 81–89.
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Belov, A.I., Mikhaylov, A.N., Korolev, D.S. et al. The effect of irradiation with H+ and Ne+ ions on resistive switching in metal–insulator–metal memristive structures based on SiO x . Tech. Phys. Lett. 41, 957–960 (2015). https://doi.org/10.1134/S106378501510003X
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DOI: https://doi.org/10.1134/S106378501510003X