Abstract
We present the results of optimization of the design and molecular beam epitaxy (MBE) growth technology of N-AlGaAs:Si/n +-GaAs:Si/p +-GaAs:Be/P-AlGaAs:Be heterostructures for tunnel diodes (TDs). The achieved maximum peak current density level (J p = 513 A/cm2) allows these TDs to be used for cascade connections both in multijunction solar cells and in structures of tunnel-coupled laser diodes. The initial region of the J–U curve of TDs exhibits nonlinearity that is explained by a residual potential barrier left in the p +–P–p + isotype heterojunction (confining the active region of TD) as a result of non-optimum doping of Al0.4Ga0.6As alloy.
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Original Russian Text © G.V. Klimko, T.A. Komissarova, S.V. Sorokin, E.V. Kontrosh, N.M. Lebedeva, A.A. Usikova, N.D. Il’inskaya, V.S. Kalinovskii, S.V. Ivanov, 2015, published in Pis’ma v Zhurnal Tekhnicheskoi Fiziki, 2015, Vol. 41, No. 18, pp. 82–88.
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Klimko, G.V., Komissarova, T.A., Sorokin, S.V. et al. MBE-grown GaAs:Si/GaAs:Be tunnel diodes for multijunction solar cells. Tech. Phys. Lett. 41, 905–908 (2015). https://doi.org/10.1134/S1063785015090229
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DOI: https://doi.org/10.1134/S1063785015090229