Skip to main content
SpringerLink
Log in

Modification of the Surface Properties of Free Si–Cu Films by Implantation of Active Metal Ions

  • PHYSICS OF NANOSTRUCTURES
  • Published:
Technical Physics Aims and scope Submit manuscript

Abstract

Using the methods of Auger electron spectroscopy, electron energy loss spectroscopy, and UV photoelectron spectroscopy, the influence of Ba+ ion implantation on the composition, crystal structure, and electron configuration of the surface of Si–Cu(100) free films have been investigated. Specifically, it has been shown that Ba ion implantation and subsequent annealing make it possible to obtain BaSi nanofilms with some excess (to 10 at %) of unbounded silicon atoms.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Fig. 1.
Fig. 2.
Fig. 3.
Fig. 4.
Fig. 5.

Similar content being viewed by others

REFERENCES

  1. F. Komarov, L. Vlasukova, M. Greben, O. Milchanin, J. Zuk, W. Wesch, E. Wendler, and A. Togambaeva, Nucl. Instrum. Methods Phys. Res., Sect. B 307, 102 (2013).

    Google Scholar 

  2. A. L. Stepanov, A. A. Trifonov, Y. N. Osin, V. F. Valeev, and V. I. Nuzhdin, Optoelectron. Adv. Mater., Rapid Commun. 7, 692 (2013).

    Google Scholar 

  3. D. N. Leong, M. A. Harry, K. J. Reeson, and K. P. Homewood, Appl. Phys. Lett. 68, 1649 (1996).

    Article  ADS  Google Scholar 

  4. D. M. Muradkabilov, D. A. Tashmukhamedova, and B. E. Umirzakov, J. Surf. Invest.: X-Ray, Synchrotron Neutron Tech. 7, 967 (2013).

    Article  Google Scholar 

  5. B. E. Umirzakov, D. A. Tashmukhamedova, M. K. Ruzibaeva, A. K. Tashatov, S. B. Donaev, and B. B. Mavlyanov, Tech. Phys. 58, 1383 (2013).

    Article  Google Scholar 

  6. A. A. Aliev, Z. A. Isakhanov, and M. K. Ruzibaeva, J. Surf. Invest.: X-Ray, Synchrotron Neutron Tech. 6, 149 (2012).

    Article  Google Scholar 

  7. B. E. Umirzakov, Z. A. Isakhanov, M. K. Ruzibaeva, Z. E. Mukhtarov, and A. S. Khalmatov, Tech. Phys. 60, 600 (2015).

    Article  Google Scholar 

  8. L. S. Palatnik, M. Ya. Fuks, and V. M. Kosevich, Formation Mechanism and Substructure of Condensed Films (Nauka, Moscow, 1972).

    Google Scholar 

  9. K. Wakashima, M. Fukamachi, and S. Nagakura, Jpn. J. Appl. Phys. 8, 1167 (1969).

    Article  ADS  Google Scholar 

  10. Z. A. Isakhanov, T. Kodirov, A. S. Halmatov, M. K. Ruzibaeva, Z. E. Muhtarov, and B. E. Umirzakov, J. Surf. Invest.: X-Ray, Synchrotron Neutron Tech. 11, 152 (2017).

    Article  Google Scholar 

  11. Z. A. Isakhanov, B. E. Umirzakov, T. Kodirov, A.  S.  Khalmatov, and E. S. Ergashov, UZB Patent No. IAP 05741 (December 25, 2018).

  12. X-Ray and Electron Spectra and Chemical Bonds, Ed. by V. V. Gorganov (Dal’nevost. Univ., Vladivostok, 1986), pp. 222–290.

    Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Institute of Ion–Plasma and Laser Technologies, 100125, Tashkent, Uzbekistan

    Z. A. Isakhanov & R. M. Erkulov

  2. Tashkent State Technical University, 100097, Tashkent, Uzbekistan

    I. O. Kosimov & B. E. Umirzakov

Authors
  1. Z. A. Isakhanov
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. I. O. Kosimov
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. B. E. Umirzakov
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. R. M. Erkulov
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to Z. A. Isakhanov.

Ethics declarations

The authors claim that they do not have any conflicts of interest.

Additional information

Translated by V. Isaakyan

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Isakhanov, Z.A., Kosimov, I.O., Umirzakov, B.E. et al. Modification of the Surface Properties of Free Si–Cu Films by Implantation of Active Metal Ions. Tech. Phys. 65, 114–117 (2020). https://doi.org/10.1134/S1063784220010090

Download citation

  • Received:

  • Revised:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1134/S1063784220010090

Search

Navigation