Abstract
A theoretical model has been suggested that makes it possible to predict the profile of a film deposited on the walls of a high aspect ratio structure (trench) by atomic layer deposition versus the deposition parameters. In addition, the model allows one to calculate the optimal time of precursor doping that provides the conformal coating of the trench walls. The deposition of films with different thicknesses has been described by an approximant that includes two asymptotical deposition conditions with different relationships between the precursor molecule sticking coefficient and aspect ratio of the trench.
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References
Atomic Layer Deposition of Nanostructured Materials, Ed. by N. Pinna and M. Knez (Wiley, 2012).
M. Rose and J. W. Bartha, Appl. Surface Sci. 255, 6620 (2009).
H. C. M. Knoops, E. Langereis, M. C. M. van de Sanden, and M. M. Kessels, J. Electrochem. Soc. 157, G241 (2010).
R. G. Gordon, D. Hausmann, E. Kim, and J. Shepard, Chem. Vap. Deposition 9, 73 (2003).
A. Yanguas-Gil and J. W. Elam, ECS Trans. 41, 169 (2011).
A. Yanguas-Gil and J. W. Elam, Chem. Vap. Deposition 18, 46 (2012).
W. B. Wang and J. R. Abelson, J. Appl. Phys. 116, 116 (2014).
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Original Russian Text © A.V. Fadeev, A.V. Myakon’kikh, K.V. Rudenko, 2018, published in Zhurnal Tekhnicheskoi Fiziki, 2018, Vol. 63, No. 2, pp. 243–250.
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Fadeev, A.V., Myakon’kikh, A.V. & Rudenko, K.V. Analytical Model of Atomic Layer Deposition of Films on 3D Structures with High Aspect Ratios. Tech. Phys. 63, 235–242 (2018). https://doi.org/10.1134/S1063784218020123
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DOI: https://doi.org/10.1134/S1063784218020123