Abstract
The influence of the rotation frequency of a disk substrate holder on the growth mechanism and crystal structure characteristics of MOCVD-grown GaAs layers has been studied. In the frequency range of 0–400 rpm, variations have been observed in the growth mechanism and rate, as well as of crystal perfection.
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References
Molecular Beam Epitaxy and Heterostructures, Ed. by L. L. Chang and K. Ploog (Martimus Nijhoff, Amsterdam,1985).
M. A. Herman, W. Richter, and H. Sitter, Epitaxy: Physical Principles and Technical Implementation (Springer, Berlin, 2004).
G. B. Stringfellow, Organometallic Vapor-Phase Epitaxy: Theory and Practice (Academic, Boston, 1999).
P. B. Boldyrevskii, A. G. Korovin, S. A. Denisov, S. P. Svetlov, and V. G. Shengurov, Tech. Phys. 59, 1732 (2014).
P. B. Boldyrevskii and O. I. Khrykin, Izv. Akad. Nauk SSSR, Neorg. Mater. 26, 2215 (1990).
E. L. Pankratov and P. B. Boldyrevskii, J. Appl. Mech. Tech. Phys. 57, 637 (2016).
V. G. Levich, Physicochemical Fluid Dynamics (Fizmatgiz, Moscow, 1962).
R. Garcia and R. Perez, Surf. Sci. Rep. 47, 197 (2002).
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Original Russian Text © P.B. Boldyrevskii, D.O. Filatov, I.A. Kazantseva, M.V. Revin, D.S. Smotrin, P.A. Yunin, 2018, published in Zhurnal Tekhnicheskoi Fiziki, 2018, Vol. 63, No. 2, pp. 219–223.
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Boldyrevskii, P.B., Filatov, D.O., Kazantseva, I.A. et al. Influence of the Rotation Frequency of a Disk Substrate Holder on the Crystal Structure Characteristics of MOCVD-Grown GaAs Layers. Tech. Phys. 63, 211–215 (2018). https://doi.org/10.1134/S1063784218020068
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DOI: https://doi.org/10.1134/S1063784218020068