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Mathematical simulation of the temperature profile of metal films under pulsed photon annealing

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Abstract

The exact solution to the system of heat conduction equations for the electron and phonon subsystem is obtained using the thermal peak model; the temperature of the film subjected to incoherent optical irradiation is determined. The effects of thermal contact with surroundings and electromagnetic radiation damping on the spatial temperature distribution in an aluminum film are analyzed. Recommendations are given for the choice of the optimal regime of the photon annealing.

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Correspondence to A. V. Shuba.

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Original Russian Text © V.N. Nechaev, A.V. Shuba, 2014, published in Zhurnal Tekhnicheskoi Fiziki, 2014, Vol. 84, No. 12, pp. 8–12.

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Nechaev, V.N., Shuba, A.V. Mathematical simulation of the temperature profile of metal films under pulsed photon annealing. Tech. Phys. 59, 1744–1748 (2014). https://doi.org/10.1134/S1063784214120202

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  • DOI: https://doi.org/10.1134/S1063784214120202

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