Abstract
A charge control based analytical model is followed to study the impact of donor-layer doping and gate-length on microwave frequency performance of AlGaN/GaN/AlGaN double heterostructure high electron mobility transistor (DH-HEMT). DH-HEMT is observed to be more sensitive to gate-length and doping variation as compared to single heterostructure high electron mobility transistor (SH-HEMT). The effect of gate-length and doping on various performance parameters, i.e., transconductance, drain conductance, cut-off frequency and maximum oscillation frequency has been analysed. The results so obtained are compared with simulation results and are found to be in good agreement.
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ACKNOWLEDGMENTS
The authors would like to thank Defence Research and Development Organisation (DRDO), Ministry of Defence (Govt. of India) for providing the necessary financial assistance under the grant ERIP/P/ER/DG-Med and CoS/991115506/M/01/1663 to carry out this research work.
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Chugh, N., Kumar, M., Bhattacharya, M. et al. Analysis of Al0.15Ga0.85N/GaN/Al0.15Ga0.85N DH-HEMT for RF and Microwave Frequency Applications. Semiconductors 53, 1784–1791 (2019). https://doi.org/10.1134/S1063782619130050
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DOI: https://doi.org/10.1134/S1063782619130050