Abstract
The results of using carbidsiliconoxide (a-C:SiO1.5) films with a thickness of 30–60 nm, produced by the pyrolysis annealing of oligomethylsilseskvioksana (CH3–SiO1.5) n with cyclolinear (staircased) molecular structure, as intermediate films in the hydride vapor phase epitaxy of gallium nitride on polycrystalline CVD-diamond substrates are presented. In the pyrolysis annealing of (CH3–SiO1.5) n films in an atmosphere of nitrogen at a temperature of 1060°C, methyl radicals are carbonized to yield carbon atoms chemically bound to silicon. In turn, these atoms form a SiC monolayer on the surface of a-C:SiO1.5 films via covalent bonding with silicon. It is shown that GaN islands grow on such an intermediate layer on CVD-polydiamond substrates in the process of hydride vapor phase epitaxy in a vertical reactor from the GaCl–NH3–N2 gas mixture.
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Original Russian Text © P.A. Averichkin, A.A. Donskov, M.P. Dukhnovsky, S.N. Knyazev, Yu.P. Kozlova, T.G. Yugova, I.A. Belogorokhov, 2016, published in Fizika i Tekhnika Poluprovodnikov, 2016, Vol. 50, No. 4, pp. 563–566.
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Averichkin, P.A., Donskov, A.A., Dukhnovsky, M.P. et al. Possibility of the use of intermediate carbidsiliconoxide nanolayers on polydiamond substrates for gallium nitride layers epitaxy. Semiconductors 50, 555–558 (2016). https://doi.org/10.1134/S1063782616040047
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DOI: https://doi.org/10.1134/S1063782616040047