Abstract
The linear charge coupling effect of threshold voltages V th of the bottom (field) gate, i.e., a substrate of the silicon-on-insulator structure of fully depleted n-MIC transistors on a lightly doped silicon layer 20–50 nm thick, is studied depending on the voltage V bg of the top asymmetrically biased (with negative polarity) N +-poly-Si gate. It is shown that the quantum-mechanical correction conditioned by the electrostatically induced size effect of the transverse field should be considered when determining the linear charge coupling region between gates even at a silicon layer thickness of ∼50 nm. An increase in the positive charge on the surface states at the heterointerface with a silicon layer increases the quantum-mechanical correction by a factor of 2–4 due to the quantum capacitance effect affecting donor-trap recharging in the case of a significant difference between the opposite-polarity potentials of the two gates.
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Original Russian Text © V.P. Popov, M.A. Ilnitsky, O.V. Naumova, A.N. Nazarov, 2014, published in Fizika i Tekhnika Poluprovodnikov, 2014, Vol. 48, No. 10, pp. 1348–1353.
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Popov, V.P., Ilnitsky, M.A., Naumova, O.V. et al. Quantum corrections to threshold voltages for fully depleted SOI transistors with two independent gates. Semiconductors 48, 1312–1317 (2014). https://doi.org/10.1134/S1063782614100248
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DOI: https://doi.org/10.1134/S1063782614100248