Abstract
Transistor heterostructures with high-carrier-mobility have been studied. It is shown that, as the γ-irradiation dose Φ increases, their degradation occurs in the following sequence. (i) At Φ < 107 rad, the GaAs surface layer is damaged to a depth of 10 nm due to a >0.2-eV decrease in the diffusion energy of intrinsic defects and, probably, atmospheric oxygen. (ii) At Φ > 107 rad, highly structurally disordered regions larger than 1 μm are formed near microscopic defects or dislocations. (iii) At Φ > 108 rad, there occurs degradation of the internal AlGaAs/InGaAs/GaAs interfaces and the working channel. An effective method for studying the degradation processes in heterostructures is to employ a set of structural diagnostic methods to analyze processes of radiation-induced and aging degradation, in combination with theoretical simulation of the occurring processes.
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Original Russian Text © A.V. Bobyl, S.G. Konnikov, V.M. Ustinov, M.V. Baidakova, N.A. Maleev, D.A. Sakseev, R.V. Konakova, V.V. Milenin, I.V. Prokopenko, 2012, published in Fizika i Tekhnika Poluprovodnikov, 2012, Vol. 46, No. 6, pp. 833–844.
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Bobyl, A.V., Konnikov, S.G., Ustinov, V.M. et al. Radiation-induced surface degradation of GaAs and high electron mobility transistor structures. Semiconductors 46, 814–824 (2012). https://doi.org/10.1134/S1063782612060085
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DOI: https://doi.org/10.1134/S1063782612060085