Abstract
It is demonstrated that the thickness and the electrical characteristics of thin insulator and metal films in layered structures can be determined from the reflection and transmission spectra of optical and microwave radiation interacting with these films. Measurements of the refractive index of SnO2 films in the range of thicknesses 40 nm to 2.8 μm and the electrical conductivity of Cr films deposited on ceramic substrates are reported.
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Original Russian Text © D.A. Usanov, Al.V. Skripal’, An.V. Skripal’, A.V. Abramov, A.S. Bogolyubov, Ali Bakouei, 2011, published in Izvestiya vysshikh uchebnykh zavedenii. Elektronika, 2010, Vol. 83, No. 3, pp. 44–50.
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Usanov, D.A., Skripal’, A.V., Skripal’, A.V. et al. Measurement of the parameters of nanometer films by optical and microwave methods. Semiconductors 45, 1694–1698 (2011). https://doi.org/10.1134/S1063782611130203
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DOI: https://doi.org/10.1134/S1063782611130203