Abstract
The formation of ordered GaAs nanowhiskers obtained on GaAs (111)As substrates using electron-beam lithography and catalytic molecular-beam epitaxy (MBE) growth is studied experimentally. The main parameters of the e-beam lithographic process necessary for obtaining Au catalyst droplets 10–150 nm in size are determined. It is established that subsequent MBE growth proceeds predominantly by the diffusion mechanism. In the regions subjected to a repeated e-beam exposure after the lift-off process, suppression of nanowhisker growth can take place.
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A. I. Persson, L. E. Froberg, L. Samuelson, and H. Linke, Nanotechnology 20, 225304 (2009).
V. G. Dubrovskii, G. E. Cirlin, and V. M. Ustinov, Fiz. Tekh. Poluprovodn. 43, 1585 (2009) [Semiconductors 43, 1539 (2009)].
G. E. Cirlin, V. G. Dubrovskii, I. P. Soshnikov, N. V. Sibirev, Yu. B. Samsonenko, A. D. Bouravleuv, J. C. Harmand, and F. Glas, Phys. Status Solidi RRL 3(4), 112 (2009).
X. Mei, D. Kim, H. E. Ruda, and Q. X. Guo, Appl. Phys. Lett. 81, 361 (2002).
J. Noborisaka, J. Motohisa, S. Hara, and T. Fukui, Appl. Phys. Lett. 87, 093109 (2005).
C. M. Sotomayor Torres, F. D. Wang, N. N. Ledentsov, and Y.-S. Tang, Proc. SPIE 2141, 2 (1994).
Optical properties of Low Dimensional Semiconductors, Ed. by G. Abstreiter, A. Aydinli, and J.-P. Leburton, NATO ASI Ser. E: Applied Sciences (Kluwer Acad., Dordrecht, The Netherlands, 1997), v. 344.
M.-F. Ng, L. Zhou, S.-W. Yang, L. Y. Sim, V. B. C. Tan, and P. Wu, Phys. Rev. B 76, 155435 (2007).
J. N. Randall, M. A. Reed, T. M. Moore, R. J. Matyi, and J. W. Lee, J. Vac. Sci. Technol. B 6, 302 (1998).
H. E. Ruda, J. C. Polanyi, J. S. Y. Yang, Z. Wu, U. Philipose, T. Xu, S. Yang, K. L. Kavanagh, J. Q. Liu, L. Yang, Y. Wang, K. Robbie, J. Yang, K. Kaminska, D. G. Cooke, F. A. Hegmann, A. J. Budz, and H. K. Haugen, Nanoscale Res. Lett. 1, 99 (2006).
A. I. Persson, L. E. Froberg, L. Samuelson, and H. Linke, Nanotechnology 20, 225–304 (2009).
I. A. Dmitriev and R. A. Suris, Phys. Status Solidi A 202, 987 (2005).
N. N. Ledentsov, D. Litvinov, A. Rosenauer, D. Gerthsen, I. P. Soshnikov, V. A. Shchukin, V. M. Ustinov, A. Y. Egorov, A. E. Zhukov, V. A. Volodin, M. D. Efremov, V. V. Preobrazhenskii, B. P. Semyangin, D. Bimberg, and Z. I. Alferov, J. Electron. Mater. 30, 463 (2001).
D. Litvinov, A. Rosenauer, D. Gerthsen, N. N. Ledentsov, D. Bimberg, G. A. Ljubas, V. V. Bolotov, V. A. Volodin, M. D. Efremov, V. V. Preobrazhenskii, B. R. Semyagin, and I. P. Soshnikov, Appl. Phys. Lett. 81, 1080 (2002).
V. A. Shchukin, N. N. Ledentsov, A. Hoffmann, D. Bimberg, I. P. Soshnikov, B. V. Volovik, V. M. Ustinov, D. Litvinov. and D. Gerthsen, Phys. Status Solidi B 224, 503 (2001).
V. G. Dubrovskii, G. E. Cirlin, I. P. Soshnikov, A. A. Tonkikh, N. V. Sibirev, Yu. B. Samsonenko, and V. M. Ustinov, Phys. Rev. B 71, 205325 (2005).
B. Charlot, W. Sun, K. Yamashita, H. Fujita, and H. Toshiyoshi, J. Micromech. Microeng. 18, 045005 (2008).
Y. Gebremichael, A. Sanchez, X. Borrise, M. Schmidt, A. R. Goci, M. I. Alonso, R. Rurali, J. Sune, X. Cartoixa, and F. Perez-Murano, Microelectron. Eng. 87, 1479 (2010).
B. S. Simpkins, P. E. Pehrsson, M. L. Taheri, and R. M. Stroud, J. Appl. Phys. 101, 094305 (2007).
H.-Q. Zhao, S. Kasai, Y. Shiratori, and T. Hashizume, Nanotechnology 20, 245203 (2009).
J. B. Cui, Sci. China Ser. E: Technol. Sci. 52, 313 (2009).
E. I. Givargizov, Kristallografiya 54, 665 (2009) [Crystallogr. Rep. 54, 625 (2009)].
I. P. Soshnikov, G. E. Cirlin, A. A. Tonkikh, V. N. Nevedomskii, Yu. B. Samsonenko, and V. M. Ustinov, Fiz. Tverd. Tela 49, 1373 (2007) [Phys. Solid State 49, 1440 (2007)].
G. E. Cirlin, V. G. Dubrovskii, N. V. Sibirev, I. P. Soshnikov, Yu. B. Samosnenko, A. A. Tonkikh, and V. M. Ustinov, Fiz. Tekh. Poluprovodn. 39, 587 (2005) [Semiconductors 39, 547 (2005)].
I. P. Soshnikov, Pis’ma Zh. Tekh. Fiz. 31(15), 29 (2005) [Tech. Phys. Lett. 31, 644 (2005)].
M. Tchernycheva, G. E. Cirlin, G. Patriarche, L. Travers, V. Zwiller, U. Perinetti, and J.-C. Harmand, Nano Lett. 7, 1500 (2007).
M. T. Bjork, B. J. Ohlsson, T. Sass, A. I. Persson, C. Thelander, M. H. Magnusson, K. Deppert, L. R. Wallenberg, and L. Samuelson, Appl. Phys. Lett. 80, 1058 (2001).
W. Seifert, M. Borgstrom, K. Deppert, K. A. Dick, J. Johansson, M. W. Larsson, T. Martensson, N. Skold, C. P. T. Svensson, B. A. Wacaser, L. R. Wallenberg, and L. Samuelson, J. Cryst. Growth 272, 211 (2004).
T. Bryllert, L. E. Wernersson, T. Lowgren, and L. Samuelson, Nanotechnology 17, S227 (2006).
F. Glas, Phys. Rev. B 74, 121302 (2006).
A. L. Roest, M. A. Verheijen, O. Wunnicke, S. Serafin, H. Wondergem, and E. P. A. M. Bakkers, Nanotechnology 17, S271 (2006).
I. Park, Z. Li, A. P. Pisano, and R. S. Williams, Nanotechnology 21, 015501 (2010).
I. P. Soshnikov, G. E. Cirlin, A. A. Tonkikh, Yu. B. Samsonenko, V. G. Dubrovskii, V. M. Ustinov, O. M. Gorbenko, D. Litvinov, and D. Gerthsen, Fiz. Tverd. Tela 47, 2121 (2005) [Phys. Solid State 47, 2213 (2005)].
Handbook of Microlithography, Micromachining, and Microfabrication, Ed. by P. Rai-Choudhury (SPIE Opt. Eng., Washington, 1997), vol. 1.
W. M. Moreau, Microlitography, in 2 parts (Plenum, New York, 1988; Mir, Moscow, 1990).
A. A. Tseng, C. Kuan, C. D. Chen, and K. J. Ma, IEEE Trans. Electron. Pack. Manufact. 26, 141 (2003).
Ya. E. Geguzin and Yu. S. Kaganovskii, Usp. Fiz. Nauk 125, 489 (1978) [Sov. Phys. Usp. 21, 611 (1978)].
S. A. Kukushkin and V. V. Slezov, Disperse Systems on Solid Surfaces. Mechanisms of Formation of Thin Films (Evolutionary Approach) (Nauka, St.-Petersburg, 1996) [in Russian].
G. E. Cirlin, V. G. Dubrovskii, Yu. B. Samsonenko, A. D. Bouravleuv, K. Durose, Y. Y. Proskuryakov, Budhikar Mendes, L. Bowen, M. A. Kaliteevski, R. A. Abram, and Dagou Zeze, Phys. Rev. B 82, 035302 (2010).
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Original Russian Text © I.P. Soshnikov, D.E. Afanas’ev, G.E. Cirlin, V.A. Petrov, E.M. Tanklevskaya, Yu.B. Samsonenko, A.D. Bouravlev, A.I. Khrebtov, V.M. Ustinov, 2011, published in Fizika i Tekhnika Poluprovodnikov, 2011, Vol. 45, No. 6, pp. 840–846.
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Soshnikov, I.P., Afanas’ev, D.E., Cirlin, G.E. et al. Fabrication of ordered GaAs nanowhiskers using electron-beam lithography. Semiconductors 45, 822–827 (2011). https://doi.org/10.1134/S1063782611060236
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DOI: https://doi.org/10.1134/S1063782611060236