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Active region based on graded-gap InGaN/GaN superlattices for high-power 440- to 470-nm light-emitting diodes

  • Physics of Semiconductor Devices
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Abstract

The structural and optical properties of light-emitting diode structures with an active region based on ultrathin InGaN quantum wells limited by short-period InGaN/GaN superlattices from both sides have been investigated. The dependences of the external quantum efficiency on the active region design are analyzed. It is shown that the use of InGaN/GaN structures as limiting graded-gap short-period superlattices may significantly increase the quantum efficiency.

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Correspondence to A. F. Tsatsulnikov.

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Original Russian Text © A.F. Tsatsulnikov, W.V. Lundin, A.V. Sakharov, E.E. Zavarin, S.O. Usov, A.E. Nikolaev, N.A. Cherkashin, B.Ya. Ber, D.Yu. Kazantsev, M.N. Mizerov, Hee Seok Park, M. Hytch, F. Hue, 2010, published in Fizika i Tekhnika Poluprovodnikov, 2010, Vol. 44, No. 1, pp. 96–100.

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Tsatsulnikov, A.F., Lundin, W.V., Sakharov, A.V. et al. Active region based on graded-gap InGaN/GaN superlattices for high-power 440- to 470-nm light-emitting diodes. Semiconductors 44, 93–97 (2010). https://doi.org/10.1134/S1063782610010161

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  • DOI: https://doi.org/10.1134/S1063782610010161

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