Abstract
The Raman effect in grooved silicon structures consisting of an array of cavities (grooves) and silicon layers is studied. It is found that the intensity of the Stokes component increases severalfold when the thickness of the silicon layers (1–2 μm) is close to the excitation wavelength. The results obtained, interpreted as a manifestation of the effects of localization of light, suggest that grooved structures of this kind offer promise as matrices providing for enhanced efficiency of the Raman scattering.
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References
M. Elwenspoek and H. V. Jansen, Silicon Micromachining (Cambridge Univ. Press, Cambridge, 1998).
V. A. Tolmachev, E. V. Astrova, Yu. A. Pilyugina, et al., Opt. Mater. 27, 831 (2005).
E. V. Astrova, T. S. Perova, V. A. Tolmachev, et al., Fiz. Tekh. Poluprovodn. (St. Petersburg) 37, 417 (2003) [Semiconductors 37, 399 (2003)].
E. Yu. Krutkova, L. A. Golovan’, V. Yu. Timoshenko, et al., Fiz. Tekh. Poluprovodn. (St. Petersburg) 40, 855 (2006) [Semiconductors 40, 834 (2006)].
M. Born and E. Wolf, Principles of Optics, 4th ed. (Pergamon, Oxford, 1969; Nauka, Moscow, 1970).
O. Boyraz and B. Jalali, Opt. Express 12, 5269 (2004).
D. Dimitropoulos, S. Fathpour, and B. Jalali, Appl. Phys. Lett. 87, 261108 (2005).
P. Yu and M. Cardona, Fundamentals of Semiconductors (Springer, Berlin, 1996; Fizmatlit, Moscow, 2002).
S. Sze, Physics of Semiconductor Devices, 2nd ed. (Wiley, New York, 1981; Mir, Moscow, 1984).
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Original Russian Text © A.V. Zoteev, L.A. Golovan’, E.Yu. Krutkova, A.V. Laktyun’kin, D.A. Mamichev, P.K. Kashkarov, V.Yu. Timoshenko, E.V. Astrova, T.S. Perova, 2007, published in Fizika i Tekhnika Poluprovodnikov, 2007, Vol. 41, No. 8, pp. 989–991.
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Zoteev, A.V., Golovan’, L.A., Krutkova, E.Y. et al. Enhancement of the Raman scattering in grooved silicon structures. Semiconductors 41, 970–972 (2007). https://doi.org/10.1134/S1063782607080209
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DOI: https://doi.org/10.1134/S1063782607080209