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AFM application for in situ study of adsorption processes

  • The 8th International Workshop on Beam Injection Assessment of Microstructures in Semiconductors, June 11–14, 2006, St. Petersburg, Russia
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Abstract

Comparison of calculated and experimental data allows us to assume the following mechanism of H2O adsorption in dynamic conditions at high temperature: during the adsorption of the first portions of sorbate on the silica gel surface, the thin film of water overlaps the access to intrapore space and the adsorption proceeds only on the exterior surface of the sorbent.

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Authors and Affiliations

  1. St. Petersburg State Technological Institute, St. Petersburg, 198103, Russia

    E. A. Sosnov, S. A. Belova & A. A. Malygin

Authors
  1. E. A. Sosnov
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  2. S. A. Belova
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  3. A. A. Malygin
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The text was submitted by the authors in English.

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Sosnov, E.A., Belova, S.A. & Malygin, A.A. AFM application for in situ study of adsorption processes. Semiconductors 41, 495–497 (2007). https://doi.org/10.1134/S1063782607050016

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  • DOI: https://doi.org/10.1134/S1063782607050016

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