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Ion flux onto a nonconducting surface in a beam-plasma discharge: Simulation and experiment

  • Plasma-Beam Processes
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Abstract

Computer simulations of a plasma sheath formed near a nonconducting surface in a beamplasma discharge (BPD) at a low magnetic field in the reactor chamber are performed. The results of computer simulations are compared with experimental data. The optimal mode of GaAs etching in a BPD-based plasma processing reactor is chosen using results of computer simulations. Simulations for carbon (DLC) film sputtering modes in the framework of a similar model are also performed.

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References

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Authors and Affiliations

  1. Moscow Engineering Physics Institute, Kashirskoe sh. 31, Moscow, 115409, Russia

    V. A. Kurnaev

  2. Kotelnikov Institute of Radio Engineering and Electronics (Fryazino Branch), Russian Academy of Sciences, pl. Vvedenskogo 1, Fryazino, Moscow oblast, 141190, Russia

    V. V. Peskov, A. I. Chmil’ & E. G. Shustin

Authors
  1. V. A. Kurnaev
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  2. V. V. Peskov
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  3. A. I. Chmil’
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  4. E. G. Shustin
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Additional information

Original Russian Text © V.A. Kurnaev, V.V. Peskov, A.I. Chmil’, E.G. Shustin, 2009, published in Prikladnaya Fizika, 2009, No. 6, pp. 118–122.

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Kurnaev, V.A., Peskov, V.V., Chmil’, A.I. et al. Ion flux onto a nonconducting surface in a beam-plasma discharge: Simulation and experiment. Plasma Phys. Rep. 36, 1177–1180 (2010). https://doi.org/10.1134/S1063780X10130143

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  • DOI: https://doi.org/10.1134/S1063780X10130143

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