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Application of time–frequency wavelet analysis in the reflectometry of thin films

  • Surface and Thin Films
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Abstract

The application of time–frequency wavelet analysis for solving the reflectometry inverse problem is considered. It is shown that a simultaneous transform of specular intensity curve, depending on the grazing angle and spatial frequency, allows one to determine not only the thickness but also the alteration order of individual regions (layers) with characteristic behavior of electron density. This information makes it possible to reconstruct the electron density profile in the film cross section as a whole (i.e., to solve the inverse reflectometry problem). The application of the time–frequency transform is illustrated by examples of reconstructing (based on X-ray reflectivity data) the layer alternation order in models of two-layer films with inverted arrangement of layers and a four-layer film on a solid substrate.

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Authors and Affiliations

  1. Shubnikov Institute of Crystallography, Federal Scientific Research Centre “Crystallography and Photonics”, Russian Academy of Sciences, Moscow, 119333, Russia

    S. B. Astaf’ev & L. G. Yanusova

  2. Faculty of Computational Mathematics and Cybernetics, Moscow State University, Moscow, 119991, Russia

    B. M. Shchedrin

Authors
  1. S. B. Astaf’ev
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  2. B. M. Shchedrin
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  3. L. G. Yanusova
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Corresponding author

Correspondence to S. B. Astaf’ev.

Additional information

Original Russian Text © S.B. Astaf’ev, B.M. Shchedrin, L.G. Yanusova, 2017, published in Kristallografiya, 2017, Vol. 62, No. 2, pp. 311–316.

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Astaf’ev, S.B., Shchedrin, B.M. & Yanusova, L.G. Application of time–frequency wavelet analysis in the reflectometry of thin films. Crystallogr. Rep. 62, 318–323 (2017). https://doi.org/10.1134/S1063774517020055

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  • DOI: https://doi.org/10.1134/S1063774517020055

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