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Algorithms and Systems of Machine Vision in Integrated Circuit Manufacturing Technology

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Abstract—

The work describes the algorithms and software design of machine-vision systems for controlling the critical parameters in the manufacture of integrated circuits. The advantages of the chosen design are presented. Its utility for solving the problems of microcircuit image analysis on automatic topology control equipment is considered. The described design of the software complex makes it possible to identify defects efficiently, which is especially important for the development of software for the submicron VLSI topology-control equipment. The results are used at the leading electronic engineering enterprise of the Republic of Belarus, OAO Planar, which is engaged in the development and delivery of specialized technological equipment for implementing technologies in microelectronics.

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REFERENCES

  1. S. V. Ablameiko and D. M. Lagunovskii, Image Processing: Technology, Methods, and Application (Inst. Tekh. Kibernetiki, Nats. Akad. Nauk Belarus, 2000).

    Google Scholar 

  2. S. M. Avakaw, E. A. Drogun, V. A. Rusetski, D. S. Titko, E. A. Titko, and V. G. Sholomitski, “Methods for automatic control of planar structure layout pertaining to electronics technologies products,” Nauka Tekh., No. 3, 11–16 (2013).

  3. S. Awakaw, “Semi-transparent isolated defect detection by die-to-database mask inspection using virtual scanning algorithms for sub-pixel resolution,” Proc. SPIE 5504, 26–35 (2004).  https://doi.org/10.1117/12.568022

    Article  Google Scholar 

  4. S. M. Awakaw, “Method to determine a detection capability of the die-to-database mask inspection system in regard to pinhole and pindot defects,” Proc. SPIE 5148, 119–127 (2003).  https://doi.org/10.1117/12.515104

    Article  Google Scholar 

  5. S. Awakaw, A. Korneliuk, and A. Titko, “A prospective modular platform of the mask pattern automatic inspection using die-to-database mask method,” Proc. SPIE 5853, 965–976 (2005).  https://doi.org/10.1117/12.617305

    Article  Google Scholar 

  6. S. Awakaw, A. Doudkin, Ya. Marushko, and A. Voronov, “Image stitching algorithm for description of integrated circuit layouts,” in Proc. 13th Int. Conf. on Pattern Recognition and Information Processing, Minsk, 2016 (Belarus. Gos. Univ., Minsk, 2016), pp. 139–147. https://elib.bsu.by/handle/123456789/158532

    Google Scholar 

  7. J. Azémar, “More than Moore: Market and technologies trends.” https://www.rairarubiabooks.com/related-pdf-global-microfluidic-devices-market-manufactures-and-key-statistics-analysis.html. Cited September 9, 2021.

  8. V. Bespalov, A. Kononov, and A. Komarov, “Design and mask production centre of Zelenograd: Firmware complex architecture,” Elektronika: Nauka, Tekhnol., Biznes, No. 5, 92–95 (2009). https:\www.electronics.ru\files\article_pdf\0\article_247_319.pdf. Cited May 6, 2021.

  9. S. A. Chizhik, S. P. Basalaev, V. A. Pilipenko, A. L. Khudoley, T. A. Kuznetsova, V. V. Chikunov, and A. A. Suslov, “Equipment for nondestructive testing of silicon wafers submicron topology during the fabrication of integrated circuits,” Pribory Metody Izmerenii, No. 1, 14–18 (2013).

    Google Scholar 

  10. E. R. Davies, “Automated visual inspection,” in Machine Vision, 2nd ed. (Academic Press, 1998), pp. 471–502.

    Google Scholar 

  11. A. P. Dostanko, S. M. Awakaw, O. A. Ageev, M. P. Batura, S. V. Bordusov, D. A. Golosov, V. N. Dzhuplin, S. M. Zavadskii, O. V. Klim, V. L. Lanin, S. I. Madveiko, S. N. Mel’nikov, I. B. Petukhov, G. E. Retyukhin, A. M. Rusetskii, D. S. Titko, V. S. Tomal’, G. A. Trapashko, D. I. Cherednichenko, and S. B. Shkolyk, Technological Complexes of Integrated Processes for the Production of Electronic Products (Belorusskaya Navuka, Minsk, 2016).

    Google Scholar 

  12. A. A. Doudkin and R. Kh. Sadykhov, Image Processing in Design and Production of Integrated Circuits (Ob”edinennyi Inst. Probl. Inf., Nats. Akad. Nauk Belarus, 2008).

  13. A. A. Doudkin and A. V. Inyutin, “Analysis of digital images in order to control the manufacturing of integrated circuits,” Pattern Recognit. Image Anal. 31, 119–131 (2021).  https://doi.org/10.1134/S1054661821010077

    Article  Google Scholar 

  14. E. Evans, Domain-Driven Design: Tackling Complexity in the Heart of Software (Addison-Wesley, Upper Saddle River, N.J., 2003).

    Google Scholar 

  15. D. A. Forsyth and J. Ponce, Computer Vision: A Modern Approach (Prentice Hall, 2002).

    Google Scholar 

  16. M. Fowler, D. Rice, M. Foemmel, E. Hieatt, R. Mee, and R. Stafford, Patterns of Enterprise Application Architecture (Addison-Wesley, 2002).

    Google Scholar 

  17. Ya. A. Furman, A. V. Krevetskii, A. K. Peredreev, A. A. Rozhentsov, R. G. Khafizov, I. L. Egoshina, and A. N. Leukhin, Introduction to Contour Analysis and Its Applications to Image and Signal Processing (Fizmatlit, Moscow, 2003).

    Google Scholar 

  18. E. Gamma, R. Helm, R. Johnson, and J. Vlissides, Design Patterns: Elements of Reusable Object-Oriented Software (Addison Wesley, 1995).

    MATH  Google Scholar 

  19. A. A. Glushko, G. A. Yashin, A. S. Novoselov, A. V. Amirkhanov, L. A. Zinchenko, V. V. Makarchuk, and N. A. Sergeeva, “Application of visual analytics and TCAD systems in quality management of VLSI crystal formation technological processes,” Nanoindustriya, No. S, 376–394 (2018).  https://doi.org/10.22184/1993-8578.2018.82.376.384

  20. R. C. Gonzalez and R. E. Woods, Digital Image Processing (Prentice Hall, Upper Saddle River, N.J., 2002).

    Google Scholar 

  21. A. Grabmaier, “Microelectronics in Germany and Eurrope–trends and perspectives,” in Int. Symp. on Smart Integrated system, Chemnitz, Germany, 2014. https://www.enas.fraunhofer.de/content/dam/enas/Dokumente/Deutsch/News_Events/Symposien/2014_international-symposium-on-smart-integrated-systems/ Grabmaier_AG_Microelectronics_in_Germany_and_ Europe_2014_08_12.pdf. Cited September 9, 2014.

  22. A. Khokhlun, “The concept of mini fabs for production of up-to-date integrated circuits in Russia,” Elektronika: Nauka, Tekhnol., Biznes, No. 9, 88–93 (2015).

    Google Scholar 

  23. New strategic plan of development of semiconductor technologies (ITRS). https://russianelectronics.ru/novyj-strategicheskij-plan-razvitiya-poluprovodnikovyh-tehnologij-itrs/. Cited September 20, 2021.

  24. P. Kopardekar, A. Mital, and S. Anand, “Manual, hybrid, and automated inspection literature and current research,” Integr. Manuf. Syst. 4, 18–29 (1993). https://doi.org/10.1108/09576069310023838

    Article  Google Scholar 

  25. V. V. Krasnoproshin and V. A. Obraztsov, “Problems of solvability and choice of algorithms for decision making by precedence,” Pattern Recognit. Image Anal. 16, 155–169 (2006).  https://doi.org/10.1134/S1054661806020027

    Article  Google Scholar 

  26. A. Khmyl’, V. Lanin, and S. Volkenshtein, “Method for inspecting and diagnosing hidden defects in electronic products,” Kompon. Tekhnol., No. 2, 137–142 (2010).

  27. C. Larman, Applying UML and Patterns: An Introduction to Object-Oriented Analysis and Design and Iterative Development (Addison Wesley, 2013).

    Google Scholar 

  28. A. Lokhov, “Tools for designing VLSI of Mentor Graphics company: General review,” Elektronika: Nauka, Tekhnol., Biznes, No. 7, 30–32 (2003).

    Google Scholar 

  29. J. L. C. Sanz and D. Petkovic, “Machine vision algorithm for automated inspection of thin-film disk heads,” IEEE Trans. Pattern Anal. Mach. Intell. 10, 830–848 (1988).  https://doi.org/10.1109/34.9106

    Article  Google Scholar 

  30. Methods of Computer Optics: University Handbook, 2nd ed., Ed. by V. A. Soifer (Fizmatlit, Moscow, 2003).

    Google Scholar 

  31. D. Taylor, M. Ray, and S. Hu, “Simulation-based photomask qualification using i-Virtual Stepper,” Proc. SPIE 5992, 599217 (2005).  https://doi.org/10.1117/12.634666

    Article  Google Scholar 

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Authors and Affiliations

  1. United Institute of Informatics Problems, National Academy of Sciences of Belarus, 220012, Minsk, Belarus

    A. A. Dudkin & A. A. Voronov

  2. OAO Planar, 220033, Minsk, Belarus

    S. M. Awakaw

Authors
  1. A. A. Dudkin
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  2. A. A. Voronov
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  3. S. M. Awakaw
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Corresponding authors

Correspondence to A. A. Dudkin, A. A. Voronov or S. M. Awakaw.

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COMPLIANCE WITH ETHICAL STANDARDS

This article is a completely original work of its authors; it has not been published before and will not be sent to other publications until the PRIA Editorial Board decides not to accept it for publication.

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The authors declare that they have no conflicts of interest.

Additional information

Aleksandr Anatol’evich Voronov. Born 1983. Researcher in the field of computer-aided system engineering and informatics. Graduated from the Faculty of Computer Networks and Systems of Belarusian State University of Informatics and Radioelectronics. Senior researcher of the Systems Identification Laboratory of the United Institute of Informatics Problems of the National Academy of Sciences of Belarus. Received Candidate’s degree in 2013. Associate Professor (2016). Scientific interests: digital signal processing, preliminary processing and classification of objects on images, recognition and processing of remote sensing images, designs and models of high-performance information processing systems. Author of 50 papers.

Sergei Mirzoevich Awakaw. Born 1955. Provides scientific guidance for the development of equipment for automatic topology control. Graduated from Minsk Radio Engineering Institute with a degree in automated control systems. Since 1984, works on the development of equipment for automatic topology control of planar structures at the State Research and Production Association Planar. Director of OAO Planar. Received Doctoral degree in Technology and Equipment for the Production of Semiconductors, Materials, and Devices in Electronic Engineering in 2008. Scientific interests: digital processing of signals and images for the equipment for automatic topology control and technologies and equipment for semiconductor manufacturing. Author of 96 papers, including 15 monographs, 48 articles, and 7 patents of the Republic of Belarus (two copyright certificates).

Aleksandr Arsent’evich Doudkin. Born October 1950. Researcher in the field of engineering cybernetics and informatics systems. Graduated from the Faculty of Mathematics and Physics of Vitebsk Pedagogical Institute in 1972. Head of the Systems Identification Laboratory of the United Institute of Informatics Problems of the National Academy of Sciences of Belarus. Received Doctoral degree in 2010. Professor (2016). Scientific interests: digital signal and image processing, pattern recognition, design and models of machine-vision systems and high-performance information processing. Author of more than 300 papers, including 3 monographs and 90 articles.

Translated by O. Pismenov

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Dudkin, A.A., Voronov, A.A. & Awakaw, S.M. Algorithms and Systems of Machine Vision in Integrated Circuit Manufacturing Technology. Pattern Recognit. Image Anal. 32, 266–276 (2022). https://doi.org/10.1134/S1054661822020079

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