Abstract
Magnetron sputtering of an yttrium target in a reactive atmosphere of Ar + O2 enhanced by a radio-frequency inductively coupled plasma source was studied. Four different schemes for yttrium target sputtering were examined to define the possibility to use the metallic deposition mode for a coating consisting of the yttrium oxide phase. The effective pumping speeds were calculated for all experimental schemes. The increase in the effective pumping speed from 0.24 to ~0.87 m3/s when using dual magnetron sputtering of Y and Cu targets was shown to result in the shift of the hysteresis loop towards higher O2 flow rates. This leads to the use of both transition and metallic modes of Y target sputtering in the Ar + O2 atmosphere. The oxide coating was deposited by dual magnetron sputtering of yttrium and copper targets in the metallic mode, enhanced by a radio-frequency inductively coupled plasma source. The coating consisted of Cu2O and Y2O3 phases. The calculation of Cu and Y sputtering yields was done to confirm the metallic mode of coating deposition.
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REFERENCES
J. Zhu, Y. Zhu, W. Shen, Y. Wang, J. Han, G. Tian, and B. Dai, Thin Solid Films 519, 4894 (2011). https://doi.org/10.1016/j.tsf.2011.01.049
E. Courcot, F. Rebillat, F. Teyssandierm, and C. Louchet-Pouillerie, J. Eur. Ceram. Soc. 30, 1911 (2010). https://doi.org/10.1016/j.jeurceramsoc.2010.02.012
P. Lei, J. Zhu, Y. Zhu, C. Jiangm, and X. Yin, Appl. Phys. A 108, 621 (2012). https://doi.org/10.1007/s00339-012-6940-4
M. Goral, S. Kotowski, A. Nowotnik, M. Pytel, M. Drajewiczm, and J. Sieniawski, Surf. Coat. Technol. 237, 5 (2013). https://doi.org/10.1016/j.surfcoat.2013.09.028
A. Pakseresht, F. Sharifianjazi, A. Esmaeilkhanian, L. Bazli, M. R. Nafchi, M. Bazlim, and K. Kirubaharan, Mater. Des. 222, 111044 (2022). https://doi.org/10.1016/j.matdes.2022.111044
D. Depla and S. Mahieu, Reactive Sputter Deposition, 1st ed. (Springer, Berlin, 2008).
P. Lei, W. Leroy, B. Dai, J. Zhu, X. Chen, J. Hanm, and D. Depla, Surf. Coat. Technol. 276, 39 (2015). https://doi.org/10.1016/j.surfcoat.2015.06.052
D. V. Sidelev, E. D. Voroninam, and V. A. Grudinin, Vacuum 207, 111551 (2023). https://doi.org/10.1016/j.vacuum.2022.111551
D. V. Sidelev, E. D. Voroninam, and G. A. Bleykher, Vacuum 211, 111956 (2023). https://doi.org/10.1016/j.vacuum.2023.111956
E. V. Berlin and V. J. Grigoryev, US Patent No. 9704691 (11 July 2017).
D. R. Lide and G. Baysinger, Handbook of Chemistry and Physics, 92nd ed. (CRC, Boca Raton, 2011).
J. E. Burke, Progress in Ceramic Science (Elsevier, Amsterdam, 2013).
K. Strijckmans, R. Schelfhout, and D. Depla, J. Appl. Phys. 124, 241101 (2018). https://doi.org/10.1063/1.5042084
R. Schelfhout, K. Strijckmans, and D. Depla, Surf. Coat. Technol. 399, 126097 (2020). https://doi.org/10.1016/j.surfcoat.2020.126097
R. Behrisch, Sputtering by Particle Bombardment (Springer, New York, 1981).
L. N. Rozanov, Meas. Sci. Technol. 13, 1654 (2002). https://doi.org/10.1088/0957-0233/13/10/708
J. Ziegler, J. P. Biersack, and M. D. Ziegler, TRIM (the Transport of Ions in Matter). http://www.srim.org.
M. Saraiva, V. Georgieva, S. Mahieu, K. Van Aeken, A. Bogaerts, and D. Depla, J. Appl. Phys. 107, 034902 (2010). https://doi.org/10.1063/1.3284949
K. Strijckmans, W. P. Leroy, R. De Gryse, and D. Depla, Surf. Coat. Technol. 206, 3666 (2012). https://doi.org/10.1016/j.surfcoat.2012.03.019
Y. Mao, J. Engels, A. Houben, M. Rasinski, J. Steffens, A. Terra, and J. W. Coenen, Nucl. Mater. Energy 10, 1 (2017). https://doi.org/10.1016/j.nme.2016.12.031
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This work was supported by the Russian Science Foundation (grant no. 22-29-01173).
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Sidelev, D.V., Voronina, E.D. Magnetron Deposition of Oxide Films in the Metallic Mode Enhanced by Radio-Frequency Inductively Coupled Plasma Source. J. Surf. Investig. 17, 1143–1147 (2023). https://doi.org/10.1134/S1027451023050166
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DOI: https://doi.org/10.1134/S1027451023050166