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On the direct X-ray lithographic formation of deep microstructures

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Abstract

Apparatus and technological protocols developed at the Budker Institute of Nuclear Physics, Siberian Branch, Russian Academy of Sciences (BINP SB RAS), for the method of the deep X-ray lithography of high-aspect-ratio microstructures with an arbitrarily specified topological pattern are presented. The novelty of the approach described is the use of the direct formation of deep LIGA structures in a SU-8 negative photoresist with a diaphragmed SR (synchrotron radiation) microbeam with the possibility of changing the diaphragm during exposure.

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Authors and Affiliations

  1. Budker Institute of Nuclear Physics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630090, Russia

    B. G. Goldenberg, A. G. Lemzyakov & V. F. Pindyurin

  2. Institute of Solid State Chemistry and Mechanochemistry, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630128, Russia

    A. G. Zelinsky

Authors
  1. B. G. Goldenberg
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  2. A. G. Lemzyakov
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  3. A. G. Zelinsky
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  4. V. F. Pindyurin
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Corresponding author

Correspondence to B. G. Goldenberg.

Additional information

Original Russian Text © B.G. Goldenberg, A.G. Lemzyakov, A.G. Zelinsky, V.F. Pindyurin, 2014, published in Poverkhnost’. Rentgenovskie, Sinkhrotronnye i Neitronnye Issledovaniya, 2014, No. 12, pp. 11–15.

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Goldenberg, B.G., Lemzyakov, A.G., Zelinsky, A.G. et al. On the direct X-ray lithographic formation of deep microstructures. J. Surf. Investig. 8, 1201–1204 (2014). https://doi.org/10.1134/S1027451014060275

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  • DOI: https://doi.org/10.1134/S1027451014060275

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