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Calculation of the flow of sputtered atoms returning to a target with a surface relief during sputtering in glow discharge

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Abstract

A model is constructed that describes the transport of a sputtered substance near a target with a relief surface that is sputtered in glow discharge. For a periodic relief with small amplitude, distribution of a return flow of sputtered atoms from a discharge gap is calculated by a perturbation method. It is shown that nonuniform repeated deposition of the substance sputtered from the target could be one of the causes of formation of a relief on its surface.

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Authors and Affiliations

  1. Bauman State Technical University, Kaluga Branch, ul. Bazhenova 4, Kaluga, 248030, Russia

    V. I. Kristya

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  1. V. I. Kristya
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Original Russian Text © V.I. Kristya, 2008, published in Poverkhnost’. Rentgenovskie, Sinkhrotronnye i Neitronnye Issledovaniya, No. 3, pp. 37–40.

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Kristya, V.I. Calculation of the flow of sputtered atoms returning to a target with a surface relief during sputtering in glow discharge. J. Surf. Investig. 2, 203–206 (2008). https://doi.org/10.1134/S1027451008020080

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  • DOI: https://doi.org/10.1134/S1027451008020080

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