Abstract
We consider a technique for manufacturing LIGA x-ray masks based on direct formation of a deep pattern topology of the mask by an x-ray microbeam. This technique does not require an intermediate mask, which strongly simplifies manufacturing and reduces the laboriousness and cost of the LIGA masks created. The basic processing steps (substrate pretreatment, resist coating, exposure, resist development, and galvanic process), advantages, and disadvantages of these x-ray masks are described. Examples of the created prototypes of copper LIGA masks on glassy carbon substrates and substrate-free self-supporting masks are presented.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
L. D. Artamonova, A. N. Gentselev, G. A. Deis, et al., Rev. Sci. Instrum. 63(1), 764 (1992).
L. D. Artamonova, N. I. Gavryushkina, V. N. Gashtold, et al., in The Report of Siberian Intern. Centre about 1991–1992 Years Ed. by K. V. Epshtein, (IYaF SO RAN, Novosibirsk), p. 232.
G. A. Deis, E. V. Mikhalev, V. S. Prokopenko, et al., in Report of Siberian Intern. Centre about 1991–1992 Years Ed. by K. V. Epshtein (IYaF SO RAN, Novosibirsk), p. 229.
A. N. Gentselev, B. G. Goldenberg, V. I. Kondratjev, et al., Poverkhnost. Rentgen., Sinkhrotr. Neitron. Issled. 9, 30 (2002).
O. Tabata, et al., in Proc. of the 12th IEEE Intern. Conf. Micro-Electro-Mechanical Systems (Orlando, Florida, USA, 1999), p. 252.
B. G. Belenkii, N. I. Komyak, V. E. Kurochkin, et al., Nauchn. Priborostr. 10(2), 57 (2000).
B. G. Goldenberg, V. F. Pindyurin, V. V. Lyakh, et al., in Proc. Symp. Nanophysics and Nanoelectronics (Nizhnii Novgorod, 2005), vol. 2, p. 298.
Author information
Authors and Affiliations
Additional information
Original Russian Text © E.V. Petrova, B.G. Gol’denberg, V.I. Kondrat’ev, L.A. Mezentseva, V.F. Pindyurin, A.N. Gentselev, V.S. Eliseev, V.V. Lyakh, 2007, published in Poverkhnost’. Rentgenovskie, Sinkhrotronnye i Neitronnye Issledovaniya, No. 6, pp. 14–19.
Rights and permissions
About this article
Cite this article
Petrova, E.V., Gol’denberg, B.G., Kondrat’ev, V.I. et al. Fabrication of x-ray masks on a thick substrate for deep x-ray lithography. J. Surf. Investig. 1, 307–311 (2007). https://doi.org/10.1134/S1027451007030147
Received:
Issue Date:
DOI: https://doi.org/10.1134/S1027451007030147