Abstract
A differential polarization interferometer capable of correctly measuring the optical path length in thin metamaterial layers with absorption and reflection losses has been developed. As a result of direct measurement, it is shown that an Ag(28 nm)/SiO2(12 nm) binary layer deposited on a glass substrate is characterized by a negative refractive index in a wide range of incident angles of a laser beam with a wavelength of 632.8 nm.
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ACKNOWLEDGMENTS
We are grateful to A.G. Smirnov for measuring the geometric thickness of films using the spectral ellipsometry method.
Funding
This work was supported in part by the contract no. KACST-IChNM-SIPH/01 and the Belarusian Republican Foundation for Basic Research (project no. F18AZ-003).
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Translated by N. Goryacheva
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Agashkov, A.V., Kazak, N.S. Application of a Differential Polarization Interferometer for Measuring of the Optical Path Length in Thin Metamaterial Layers with Reflection and Absorption Losses. Instrum Exp Tech 62, 532–536 (2019). https://doi.org/10.1134/S0020441219040018
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DOI: https://doi.org/10.1134/S0020441219040018