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Fast deposition of diamond-like and diamond films using a plasmatron with interelectrode inserts

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Abstract

Data on the deposition of thin wear-resistant diamond-like films (DLFs) and diamond films (DFs) are reported. Films are deposited using the chemical vapor deposition method with the application of a supersonic high-temperature plasma jet generated by a high-enthalpy plasmatron with a sectionalized interelectrode insert and a cold gas curtain of discharge chamber walls. The deposition rate for DLFs and DFs is as high as 30–50 μm/h. The best results (the absence of the graphite phase in a film) are obtained at the highest degree of ionization of the supersonic plasma jet.

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Authors and Affiliations

  1. Instituto de Plasmas de Fusao Nuclear, Laboratorio Associado, Instituto Superior Tecnico, Av. Rovisco Pais, 1049-001, Lisboa, Portugal

    D. L. Tsyganov

  2. Brest State Technical University, ul. Moskovskaya 267, Brest, 224017, Belarus

    D. L. Tsyganov, A. I. Veremeichik & M. I. Sazonov

Authors
  1. D. L. Tsyganov
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  2. A. I. Veremeichik
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  3. M. I. Sazonov
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Correspondence to D. L. Tsyganov.

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Original Russian Text © D.L. Tsyganov, A.I. Veremeichik, M.I. Sazonov, 2015, published in Pribory i Tekhnika Eksperimenta, 2015, No. 2, pp. 127–131.

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Tsyganov, D.L., Veremeichik, A.I. & Sazonov, M.I. Fast deposition of diamond-like and diamond films using a plasmatron with interelectrode inserts. Instrum Exp Tech 58, 297–301 (2015). https://doi.org/10.1134/S0020441215010303

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  • DOI: https://doi.org/10.1134/S0020441215010303

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