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A power supply for magnetron sputtering systems

  • Electronics and Radio Engineering
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Abstract

A design and electric circuits of the power supply for magnetron sputtering systems with a power of up to 5 kW are described. The power supply is intended for operation in direct-current (DC) or pulse modes with a pulse repetition rate of up to 100 kHz. The arc suppression system limits the energy delivered to the arc discharge at about 110 mJ in the DC mode and 9 mJ in the pulse mode, respectively. The possibilities of optimizing coatings by selecting working parameters of the power supply were demonstrated by the example of thin-film coatings of two types (Ag and Ga-doped ZnO thin films).

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Authors and Affiliations

  1. Institute of High-Current Electronics, Siberian Branch, Russian Academy of Sciences, pr. Akademicheskii 2/3, Tomsk, 634055, Russia

    N. S. Sochugov, V. O. Oskirko & R. E. Spirin

Authors
  1. N. S. Sochugov
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  2. V. O. Oskirko
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  3. R. E. Spirin
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Correspondence to N. S. Sochugov.

Additional information

Original Russian Text © N.S. Sochugov, V.O. Oskirko, R.E. Spirin, 2013, published in Pribory i Tekhnika Eksperimenta, 2013, No. 1, pp. 62–68.

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Sochugov, N.S., Oskirko, V.O. & Spirin, R.E. A power supply for magnetron sputtering systems. Instrum Exp Tech 56, 178–184 (2013). https://doi.org/10.1134/S0020441213010302

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  • DOI: https://doi.org/10.1134/S0020441213010302

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