Abstract
A diode laser spectrometer, which is ment for recording ortho-and paracomposition of water vapor in gas mixtures, is described. The studied mixture is probed by infrared radiation at frequencies of the resonance absorptions of ortho-and paramolecules of water (λ ≈ 1.85 μ m). The recording rate of spectral ortho-and paralines is 2 Hz, and the ortho/para composition is calculated in real time with respect to their integrated intensities. An accuracy of 1% is ensured in a 0.01- to 20-Torr partial pressure range for water vapor and in a 0- to 700-Torr partial pressure range for the buffer gas.
Similar content being viewed by others
References
Townes, C.H. and Schawlow, A.L., Microwave Spectroscopy, N.Y., London, Toronto: McGraw-Hill, 1955.
Konyukhov, V.K., Tikhonov, V.I., and Tikhonova T.L., Proc. of the Institute of General Physics of Academy of Sciences of the USSR, 1990, vol. 12, p. 208.
Tikhonov, V.I. and Volkov, A.A., Science, 2002, vol. 296, p. 2363.
Makurenkov, A.M., Artemov, V.G., Kapralov, P.O., et al., Izv. Vyssh. Uch. Zaved., Radiofiz., 2007, vol. 50, nos. 10–11, p. 918.
Nadezhdinskii, A.I., Spectrochimica Acta A., 1996, vol. 52, p. 1041.
Stepanov, E.V., Tikhonov, V.I., and Milyaev, V.A., Quantum Electronics, 2005, vol. 35, p. 205.
Penner S., Kolichestvennaya molekulyarnaya spektroskopiya i izluchatel’naya sposobnost’ gazov (Quantitative Molecular Spectroscopy and Radiant Emittance of Gases), Moscow: Mir, 1963.
Brassington, D.J., Spectroscopy in Environmental Science, New York: Wiley, 1995.
Marquardt, D., SIAM Journal on Applied Mathematics, 1963, vol. 11, p. 431.
Author information
Authors and Affiliations
Additional information
Original Russian Text © P.O. Kapralov, V.G. Artemov, A.M. Makurenkov, V.I. Tikhonov, A.A. Volkov, 2008, published in Pribory i Tekhnika Eksperimenta, 2008, No. 6, pp. 123–126.
Rights and permissions
About this article
Cite this article
Kapralov, P.O., Artemov, V.G., Makurenkov, A.M. et al. A diode-laser spectrometer for measuring ortho/para composition of water vapor. Instrum Exp Tech 51, 894–897 (2008). https://doi.org/10.1134/S0020441208060213
Received:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S0020441208060213